Zobrazeno 1 - 10
of 20
pro vyhledávání: '"G. R. Anstis"'
Publikováno v:
Microscopy of Semiconducting Materials, 1983
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f975ba090838f7c5068caba441e3483
https://doi.org/10.1201/9781003069614-3
https://doi.org/10.1201/9781003069614-3
Publikováno v:
ResearcherID
Images of defects at interfaces of strained Si1 - x Gex epilayers grown on bulk Si (001) substrates have been formed using the electron channelling contrast technique. The channelling images were obtained from bulk specimens using a highly efficient
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::07d1cea9ff1ea8195c72a0085750f5b6
https://doi.org/10.1080/01418619308219357
https://doi.org/10.1080/01418619308219357
Autor:
G. R. Anstis, D. J. H. Cockayne
Limitations on the calculation of high-resolution detail in electron microscope images of defects in crystals are discussed and it is shown how images of crystals with arbitrary strain can be calculated by means of a reinterpretation of the normal dy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::aa986af6aa0cca5c395c645fb97a99fe
https://doi.org/10.1107/s056773947900125x
https://doi.org/10.1107/s056773947900125x
Autor:
G. R. Anstis
Publikováno v:
Philosophical Magazine B. 81:1687-1699
Computer simulations are utilized to show how to use a transmission electron microscope which has an objective lens with an adjustable coefficient of spherical aberration to determine the three spatial coordinates of a single heavy atom embedded in a
Autor:
G. R. Anstis
Publikováno v:
Microscopy and Microanalysis. 5:210-211
To have an understanding of many imaging and diffraction effects relating to high-energy electrons it is essential to take into account the vibrations of the atoms of the solid being examined. Einstein's model of the vibrations takes the atoms to be
Autor:
G. R. Anstis
Publikováno v:
Proceedings, annual meeting, Electron Microscopy Society of America. 48:586-587
Weak—beam dark—field images of stacking faults in silicon vary in an interesting way as the angle of inclination of a fault to the beam changes. It is observed that the contrast of images formed with beam +g varies with angle of inclination at a
Publikováno v:
Philosophical Magazine A. 48:139-153
Abstract Dissociated dislocations in (111) foils of silicon have been imaged in the forbidden reflection of type ⅓(422). Largo contrast effects are observed at stacking faults, and thickness fringes corresponding to changes of thickness of a repeat
Publikováno v:
Philosophical Magazine A. 56:799-813
A detailed analysis of the cross-slip and annihilation of screw dislocations in B2 ordered alloys is carried out using anisotropic elasticity. The paths of the partial dislocations are calculated and it is shown that antiphase-domain boundary tubes w
Publikováno v:
Journal of the American Ceramic Society. 64:539-543
An examination is made of the sharp-indentation technique of strength-test precracking for toughness evaluation. The experimental approach follows that proposed by other workers but the theoretical analysis contains one vital new feature; the residua
Publikováno v:
Philosophical Magazine A. 46:849-862
The structure of the NiSi2/(111)Si interface is investigated by the lattice imaging of (110) cross-sectional specimens in a JEOL 200CX transmission electron microscope with 2·4 A point-to-point resolution. NiSi2 is epitaxial and doubly-positioned on