Zobrazeno 1 - 10
of 798
pro vyhledávání: '"G. R. Anstis"'
Publikováno v:
Microscopy of Semiconducting Materials, 1983
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f975ba090838f7c5068caba441e3483
https://doi.org/10.1201/9781003069614-3
https://doi.org/10.1201/9781003069614-3
Publikováno v:
ResearcherID
Images of defects at interfaces of strained Si1 - x Gex epilayers grown on bulk Si (001) substrates have been formed using the electron channelling contrast technique. The channelling images were obtained from bulk specimens using a highly efficient
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::07d1cea9ff1ea8195c72a0085750f5b6
https://doi.org/10.1080/01418619308219357
https://doi.org/10.1080/01418619308219357
Autor:
G. R. Anstis, D. J. H. Cockayne
Limitations on the calculation of high-resolution detail in electron microscope images of defects in crystals are discussed and it is shown how images of crystals with arbitrary strain can be calculated by means of a reinterpretation of the normal dy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::aa986af6aa0cca5c395c645fb97a99fe
https://doi.org/10.1107/s056773947900125x
https://doi.org/10.1107/s056773947900125x
Autor:
G. R. Anstis
Publikováno v:
Philosophical Magazine B. 81:1687-1699
Computer simulations are utilized to show how to use a transmission electron microscope which has an objective lens with an adjustable coefficient of spherical aberration to determine the three spatial coordinates of a single heavy atom embedded in a
Autor:
G. R. Anstis
Publikováno v:
Microscopy and Microanalysis. 5:210-211
To have an understanding of many imaging and diffraction effects relating to high-energy electrons it is essential to take into account the vibrations of the atoms of the solid being examined. Einstein's model of the vibrations takes the atoms to be
Autor:
G. R. Anstis
Publikováno v:
Proceedings, annual meeting, Electron Microscopy Society of America. 48:586-587
Weak—beam dark—field images of stacking faults in silicon vary in an interesting way as the angle of inclination of a fault to the beam changes. It is observed that the contrast of images formed with beam +g varies with angle of inclination at a
Autor:
Jiang, Chunlei1,2 (AUTHOR) cl.jiang@siat.ac.cn, Yan, Jiaxiao1,3 (AUTHOR), Wang, Doufeng1,4 (AUTHOR), Yan, Kunye1,3 (AUTHOR), Shi, Lei1 (AUTHOR), Zheng, Yongping1 (AUTHOR), Xie, Chengde1,2 (AUTHOR), Cheng, Hui‐Ming1 (AUTHOR), Tang, Yongbing1,4 (AUTHOR) tangyb@siat.ac.cn
Publikováno v:
Angewandte Chemie. 12/18/2023, Vol. 135 Issue 51, p1-8. 8p.
Autor:
Tian, Yun, Liu, Jianing, Xue, Mingming, Zhang, Dongyao, Wang, Yuxin, Geng, Keping, Dong, Yanchun, Yang, Yong
Publikováno v:
International Journal of Minerals, Metallurgy & Materials; Dec2024, Vol. 31 Issue 12, p2692-2705, 14p
Publikováno v:
Journal of Nano- & Electronic Physics; 2024, Vol. 16 Issue 5, p1-7, 7p
Publikováno v:
Philosophical Magazine A. 48:139-153
Abstract Dissociated dislocations in (111) foils of silicon have been imaged in the forbidden reflection of type ⅓(422). Largo contrast effects are observed at stacking faults, and thickness fringes corresponding to changes of thickness of a repeat