Zobrazeno 1 - 10
of 57
pro vyhledávání: '"G. Pohlers"'
Autor:
Chris Coenjarts, D. Desilets, J. C. Scaiano, A. Zampini, G. Pohlers, J. F. Cameron, and H. Liu, F. Ortica
Publikováno v:
Chemistry of Materials. 13:2305-2312
The photochemical behavior of four 1,2-di(arylsulfonyl)hydrazine photoacid generators has been studied by means of nanosecond laser flash photolysis (λ = 266 nm) and steady-state photolysis (λ = 254 nm) with the aim of understanding the reactions i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21d02a31f0afd05aa18683375dbb3991
https://doi.org/10.1021/cm000610y
https://doi.org/10.1021/cm000610y
Publikováno v:
Chemistry of Materials. 13:2297-2304
The photochemical behavior of four N-oxysuccinimidoarylsulfonate photoacid generators (PAGs), 1-[[phenylsulfonyl]oxy]- (PSPD), 1-[[(4-methylphenyl)sulfonyl]oxy]- (MSPD), 1-[[(4-fluorophenyl)sulfonyl]oxy]- (FSPD), 1-[[(4-chlorophenyl)sulfonyl]oxy]-2,5
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3228c57cec7cccdbd6d56a6220e63759
https://doi.org/10.1021/cm000609z
https://doi.org/10.1021/cm000609z
Publikováno v:
Chemistry of Materials. 12:414-420
In this paper we study the photophysical and photochemical behavior of two aromatic N-oxyimidosulfonate photoacid generators (PAGs), N-trifluoromethylsulfonyloxy-phthalimide (PIT) and N-trifluoromethylsulfonyloxy-1,8-naphthalimide (NIT), by means of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::12f47c51928a82b815d036940abc9499
https://doi.org/10.1021/cm990440t
https://doi.org/10.1021/cm990440t
Publikováno v:
Journal of Applied Polymer Science. 78:1897-1905
This article reports an in situ approach to studying acid loss from polymer (films of the type used in microlithiography. We developed a method which makes use of the dye coumarin 6 (C6) which has absorption characteristics which change dramatically
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b80e5457a74566b2c337022791685e3
https://doi.org/10.1002/1097-4628(20001209)78:11<1897::aid-app70>3.0.co
https://doi.org/10.1002/1097-4628(20001209)78:11<1897::aid-app70>3.0.co
Publikováno v:
Journal of the American Chemical Society. 121:6167-6175
The photochemistry and photophysics of the title compound (2), which finds application as a photoacid generator in photoresist formulations, has been investigated using a combination of laser flash...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d73d2bded5ebe5c03515d2af05593eb
https://doi.org/10.1021/ja983371c
https://doi.org/10.1021/ja983371c
Publikováno v:
Chemistry of Materials. 9:3222-3230
We report here on a new photometric method for acid quantification in nonaqueous media which has been developed to facilitate quantification for photoacid generators (PAGs) employed in resist compo...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b81629a0738b243f1323aec73a34387
https://doi.org/10.1021/cm970587p
https://doi.org/10.1021/cm970587p
Publikováno v:
Chemistry of Materials. 9:1353-1361
The photochemistry and photophysics of 2-methyl- (1), 2-(2‘-furylethylidene)- (2), and 2-[(4‘-methoxy)styryl]-4,6-bis(trichloromethyl)-1,3,5-triazine (3), three compounds that find application as photoacid generators in photoresist formulations,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f8e5698784f5c9aa6cd12ae38bb5797
https://doi.org/10.1021/cm960558z
https://doi.org/10.1021/cm960558z
Publikováno v:
Chemistry of Materials. 8:2654-2658
This paper reports a novel approach to monitor photoinduced acid generation in polymer films of the type used in microlithography. We have employed fluorescent acid-sensitive sensors to monitor the progress of photoacid generation in solution and in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::145b1fc8934c40f9eb328903f8730693
https://doi.org/10.1021/cm960186u
https://doi.org/10.1021/cm960186u
Publikováno v:
ChemInform. 31
Laser flash photolysis of 2-diazo-1,3-diphenyl-1,3-propanedione (DBD) is presumed to involve a short-lived carbene, followed by Wolff rearrangement to a long-lived ketene. We have detected ketene ylides following photolysis of DBD in the presence of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ad9fea4378adf143e8d35fd65f52ef7
https://doi.org/10.1002/chin.200033050
https://doi.org/10.1002/chin.200033050
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
Resolution and accuracy needs for the most advanced nodes, as well as fab capacities management are requirements that encourage the use of ArF resists for post-gate implant levels. In this paper, we investigate several key integration criteria that a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a23fd323e9f893cc5c972c724b7e5c1d
https://doi.org/10.1117/12.769466
https://doi.org/10.1117/12.769466