Zobrazeno 1 - 10
of 279
pro vyhledávání: '"G. Le Carval"'
Autor:
Simon Deleonibus, Claudio Fiegna, Pierpaolo Palestri, Mireille Mouis, G. Le Carval, Maud Vinet, Enrico Sangiorgi, Marco Braccioli, Thierry Poiroux
Publikováno v:
Solid-State Electronics. 52:506-513
Full-band Monte-Carlo simulations of short channel double-gate SOI nMOSFETs were used to assess possible enhancement of drain current in devices featuring a conduction band offset between the source and the channel as those obtained using non-convent
Autor:
Chrystel Deguet, K. Romanjek, Laurent Clavelier, S. Soliveres, R. Truche, M. Vinet, A. Pouydebasque, G. Le Carval, M.-C. Roure, C. Le Royer, H. Grampeix, Loic Sanchez, Claude Tabone, Simon Deleonibus, J.M. Hartmann
Publikováno v:
Solid-State Electronics. 52:1285-1290
We report on the fabrication and electrical characterization of deep sub-micron (gate length down to 105 nm) GeOI pMOSFETs. The Ge layer obtained by hetero-epitaxy on Si wafers has been transferred using the Smart Cut TM process to fabricate 200 mm G
Publikováno v:
Solid-State Electronics. 51:579-584
Drift diffusion phenomena limits the subthreshold slope of conventional MOSFET to 60 mV/dec at room temperature. This paper deals with a new type of device, the Impact Ionization MOS (IMOS), which exhibits subthreshold slopes down to a few mV/dec. Th
Autor:
J-C. Barbe, Joris Lacord, M-A. Jaud, Sebastien Martinie, Thierry Poiroux, O. Rozeau, G. Le Carval, C. Le Royer
Publikováno v:
2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
Tunnel FETs (TFET) are promising candidates for integration in logic circuits at very low supply voltages. We report here a SPICE compact model that describes all regimes of the TFET transistor. The current contribution from source and drain sides is
Publikováno v:
Journal of Computational Electronics. 6:19-22
We propose a new effective potential for including quantization effects in nanometer scaled nMOSFET. It is calculated as the convolution of a Pearson IV distribution by the Poisson potential resulting from the 2D Poisson equation. Compared to the usu
Publikováno v:
IEEE Transactions on Electron Devices. 53:1852-1857
Impact ionization MOSFET (IMOS) is a device that enables to reach subthreshold slopes as small as 5 mV/dec. This device has an asymmetric doping profile, and only a fraction of the channel is covered by the gate. In the first part of this paper, the
Publikováno v:
Journal of Computational Electronics. 5:171-175
In the last years, different techniques have been proposed to include quantization effects in simulation of electron transport in nanoscale devices. The Effective Potential approach has been demonstrated as a possible correction method for describing
Autor:
Sylvain Barraud, G. Le Carval, F. Salvetti, D. Villanueva, Herve Jaouen, Thomas Skotnicki, E. Fuchs, Philippe Dollfus
Publikováno v:
IEEE Transactions on Electron Devices. 52:2280-2289
A backscattering model suitable for compact modeling of nanoscale MOSFET is developed within the Landauer flux-scattering theory. To describe the quasi-ballistic transport, a new backscattering model based on the accurate determination of ballistic a
Autor:
J. Guy, G. Molas, A. Roule, O. Cueto, S. Barraud, G. Le Carval, J. Cluzel, O. Pollet, Mathieu Bernard, Veronique Sousa, H. Grampeix, L. Perniola, B. De Salvo, Gerard Ghibaudo, Alain Toffoli, C. Carabasse, P. Blaise, Fabien Clermidy, Vincent Delaye, P. Brianceau, V. Balan
Publikováno v:
2015 IEDM Technical Digest
2014 IEEE International Electron Devices Meeting (IEDM)
2014 IEEE International Electron Devices Meeting (IEDM), Dec 2014, San Francisco, United States. pp.6.5.1-6.5.4, ⟨10.1109/IEDM.2014.7046997⟩
2014 IEEE International Electron Devices Meeting (IEDM)
2014 IEEE International Electron Devices Meeting (IEDM), Dec 2014, San Francisco, United States. pp.6.5.1-6.5.4, ⟨10.1109/IEDM.2014.7046997⟩
International audience; In this paper, we deeply investigate for the 1st time at our knowledge the impact of the CBRAM memory stack on the Forming, SET and RESET operations. Kinetic Monte Carlo simulations, based on inputs from ab-initio calculations
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a7e492bee3996ab39ffc78497f9df656
https://hal.univ-grenoble-alpes.fr/hal-02049407
https://hal.univ-grenoble-alpes.fr/hal-02049407
Autor:
BRACCIOLI, MARCO, FIEGNA, CLAUDIO, SANGIORGI, ENRICO, P. Palestri, T. Poiroux, M. Vinet, G. Le Carval, M. Mouis
Full-band Monte Carlo simulation of short-channel Double-Gate SOI MOSFETs were used to assess possible improvement of drain current in devices featuring conduction-band offsets between the source and the channel, obyained adopting non-conventional ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______4094::ed2fda3ea23a1fd5aca226bc0f50950c
http://hdl.handle.net/11585/46091
http://hdl.handle.net/11585/46091