Zobrazeno 1 - 10
of 55
pro vyhledávání: '"G. Lammer"'
Publikováno v:
Advances in Science and Research, Vol 16, Pp 95-101 (2019)
Raindrop shapes and fall velocities measured by 2-dimensional video disdrometer are presented for 2 high-wind/turbulent events. The shapes were reconstructed using a relatively new technique. 10 m height wind sensor data are used to derive proxy-in
Externí odkaz:
https://doaj.org/article/d4581c09b5424144a9c95ff0d080b730
Publikováno v:
Advances in Geosciences, Vol 10, Pp 85-90 (2007)
The 2D-Video-Distrometer (2DVD) is a ground-based point-monitoring precipitation gauge. From each particle reaching the measuring area front and side contours as well as fall velocity and precise time stamp are recorded. In 1991 the 2DVD development
Externí odkaz:
https://doaj.org/article/192b7469e6da4f63b44cc6d5cb78f65a
Publikováno v:
AISTech 2021 Proceedings of the Iron and Steel Technology Conference.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::97e0d6294cbacb7bb66ceb1413462f79
https://doi.org/10.33313/382/169
https://doi.org/10.33313/382/169
Publikováno v:
AISTech 2021 Proceedings of the Iron and Steel Technology Conference.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3e6612621766700cd9fd2ba57782029d
https://doi.org/10.33313/382/198
https://doi.org/10.33313/382/198
Autor:
C. Traher, R. Nowak, A. Chalupka, G. Lammer, J. Fegerl, P. Wolf, L. Malek, Hans Loschner, R. Fischer, Gerhard Stengl, G. Bösch
Publikováno v:
Microelectronic Engineering. 21:187-190
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f6cd814d067b8953aa61b45091f7c7c
https://doi.org/10.1016/0167-9317(93)90052-7
https://doi.org/10.1016/0167-9317(93)90052-7
Autor:
J. Fegerl, Gerhard Stengl, G. Lammer, C. Traher, R. Nowak, A. Chalupka, P. Wolf, R. Fischer, L. Malek, Hans Loschner
Publikováno v:
Microelectronic Engineering. 17:229-240
Ion protection lithography (IPL) uses demagnifying ion optics to project open stencil mask structures onto a substrate with reduced (.. 5x, 10x, ..) scale [1]. The IPL technique offers high throughput potential by using duoplasmatron ion sources with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c6a8ada6c39995de130e40244961e558
https://doi.org/10.1016/0167-9317(92)90047-u
https://doi.org/10.1016/0167-9317(92)90047-u
Autor:
E. Haugeneder, G. Lammer, J. Lutz, Hans Loschner, Roxann L. Engelstad, Gerhard Stengl, A. Chalupka, Edward G. Lovell, Byung-Kyu Kim
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3602
The pattern placement accuracy of a stencil mask is affected by thermomechanical distortion induced during ion beam exposure. Any temperature gradient across the mask membrane could result in thermal distortions which contribute to the stringent erro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f87039362afde44049c3ec9d8480c8e
https://doi.org/10.1116/1.590312
https://doi.org/10.1116/1.590312
Autor:
E. Sossna, I. W. Rangelow, G. Unger, R. Sunyk, E. Haugeneder, Gerhard Gross, A. Oelmann, Edward G. Lovell, G. Lammer, Florian Letzkus, Rainer Kaesmaier, Peter Hudek, A. Petrashenko, F. Shi, Albrecht Ehrmann, T. Struck, A. Chalupka, Hans Loschner, Ivan Kostic, B. E. Volland, Roxann L. Engelstad, J. Butschke, R. Tejeda, R. Springer
Publikováno v:
Scopus-Elsevier
The development of stencil masks is considered to be critical to the success of the new ion projection lithography technology. We present here a p-n junction wafer flow process where all fabrication steps are realized on a bulk Si wafer except the fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e2bfcaa34732fb0e88e758150e44dc9e
https://doi.org/10.1116/1.590500
https://doi.org/10.1116/1.590500
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2369
The allowable current in ion beam projection lithography is limited by stochastic Coulomb interactions. Theories for the dependence of these interactions on the parameters of the system, i.e., length, beam energy, print size, crossover diameter, etc.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6432b6f0d40de2559f50f6df52b7cd14
https://doi.org/10.1116/1.589649
https://doi.org/10.1116/1.589649
Autor:
Gerhard Stengl, Hans Loschner, R. Fischer, W. Finkelstein, E. Hammel, E. Cekan, G. Lammer, W. Fallmann, Ivan Berry, W. H. Brünger, J. Fegerl, A. Chalupka, G. Stangl, F. Thalinger, M. Torkler, R. W. Hill, R. Nowak, Lloyd R. Harriott, F. Paschke, H. Vonach, L.‐M. Buchmann, P. Wolf, L. Malek
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:3533
Coulomb interactions in charged particle beams are known to blur beam profiles as the total current is increased. While this has been studied in single ion beam columns, similar studies have not been published, so far, for masked ion beam projection
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0713868ccf057f938e4876035d84d77b
https://doi.org/10.1116/1.587465
https://doi.org/10.1116/1.587465