Zobrazeno 1 - 10
of 37
pro vyhledávání: '"G. K. Wehner"'
Autor:
G. K. Wehner, N. Laegreid
Sputtering yields for poly crystalline semiconductor and metal targets under normally incident A + - ion bombardment were measured in the energy range from 30 to 800 eV. The measurements were made in a low pressure (2—5 μ ) high density argon plas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bd124a59f892cd7ccfdf97c077e6f950
https://doi.org/10.1016/b978-1-4831-9852-1.50037-2
https://doi.org/10.1016/b978-1-4831-9852-1.50037-2
Publikováno v:
Journal of Applied Physics. 50:3677-3683
Sputtering metal targets at low ion energies (Hg or Ar at less than 300 eV) under normal ion incidence causes the lighter atoms (lighter isotopes or lighter elements of alloys) to be preferentially ejected in a direction normal to the target surface.
Publikováno v:
Journal of Applied Physics. 64:6754-6760
Normally required high substrate temperature for achieving epitaxial film growth can be replaced by low‐energy (
Publikováno v:
Journal of Applied Physics. 45:5312-5316
Auger electron spectroscopy (AES) combined with simultaneous sputter removal of material from the sample (profiling) was used to determine changes in composition within surface layers (∼1000 A) of stainless steels which were air oxidized at various
Autor:
G. K. Wehner
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 1:487-490
A survey is given of present, still rather sketchy, knowledge of (a) preferential sputtering of certain species in multielement materials, (b) the subsequent formation of a near surface layer with altered composition, (c) the total sputtering yields
Autor:
G. K. Wehner
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 3:1821-1835
It is shown experimentally that the seed metals which can cause cone development on ion bombarded metal targets need not to have a lower sputtering yield as widely believed but rather a higher melting point. By lowering the bombarding ion energy to n
Autor:
G. K. Wehner, R. V. Stuart
Publikováno v:
Journal of Applied Physics. 35:1819-1824
Energy distributions have been obtained for atoms sputtered from Cu (100), (110), (111), and polycrystalline surfaces bombarded by 80‐ to 1200‐eV Hg and noble gas ions. Energies of sputtered atoms are found to depend markedly on the angle of ejec
Autor:
G. K. Wehner
Publikováno v:
Journal of Applied Physics. 31:1392-1397
Forces arising on ion‐bombarded electrodes have been measured with a torsion balance immersed in a low‐pressure Hg plasma. The force curves obtained for 22 metals in the range of 20 to 300 ev bombarding energy indicate that Hg+‐ions are complet
Publikováno v:
Journal of Geophysical Research. 72:3105-3129
Optical properties of moon quantitatively compared with powder samples, bombarded with ions from hydrogen discharge plasma
Autor:
M. L. Tarng, G. K. Wehner
Publikováno v:
Journal of Applied Physics. 42:2449-2452
Triode sputtering and Auger electron spectroscopy were combined in an uhv apparatus for in situ studies of the composition of ion‐bombarded surfaces of alloy targets and of sputter‐deposited films. The changes in surface composition of a 55 Cu–