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Autor:
V. G. M. Sivel, N. N. Iosad, N. M. van der Pers, G. J. Ruis, P. F. A. Alkemade, Alberto F. Morpurgo, E. V. Morks
Publikováno v:
Journal of applied physics, Vol. 95, No 12 (2004) pp. 8087-8091
We have investigated the dielectric properties of thin layers of five oxides of transition metals (Ta2O5, HfO2, ZrO2, (ZrO2)0.91(Y2O3)0.09, and Sn0.2Zr0.2Ti0.6O2) sputtered from ceramic targets at different pressures. We find that layers deposited at