Zobrazeno 1 - 10
of 38
pro vyhledávání: '"G. Haindl"'
Autor:
V. Krishnakumar, Andreas Klein, Wolfram Jaegermann, Christina Spanheimer, Tao Jiang, Ganhua Fu, Junfeng Han, G. Haindl, Cheng Liao, Kui Zhao
Publikováno v:
Journal of Alloys and Compounds. 509:5285-5289
CdS layers grown by ‘dry’ (close space sublimation) and ‘wet’ (chemical bath deposition) methods are deposited and analyzed. CdS prepared with close space sublimation (CSS) has better crystal quality, electrical and optical properties than th
Autor:
Andreas Klein, Wolfram Jaegermann, J. Schaffner, V. Krishnakumar, Junfeng Han, Chunjie Fan, Christina Spanheimer, Ganhua Fu, Kui Zhao, G. Haindl
Publikováno v:
Solar Energy Materials and Solar Cells. 95:816-820
CdS layers grown by chemical bath deposition (CBD) are treated in different ways to improve the performance of CdS/CdTe solar cells. It has been found that the open circuit voltage of the CdS/CdTe solar cell increases when the CBD CdS is annealed wit
Autor:
Tao Jiang, Wolfram Jaegermann, Junfeng Han, Ganhua Fu, G. Haindl, Christina Spanheimer, Andreas Klein, Cheng Liao, V. Krishnakumar, Kui Zhao
Publikováno v:
Materials Research Bulletin. 46:194-198
CdS layers grown by chemical bath deposition (CBD) are annealed in the oxygen and argon–hydrogen atmosphere respectively. It has been found that the open circuit voltage of the CdS/CdTe solar cell increases when the CBD CdS is annealed with oxygen
Autor:
J. Luschitz, J. Schaffner, Wolfram Jaegermann, Bastian Siepchen, Andreas Klein, G. Haindl, K. Lakus-Wollny
Publikováno v:
Thin Solid Films. 517:2125-2131
The performance of CdTe solar cells as prototype of thin film solar cells strongly depends on film morphology. The needs for high solar cell performance using thin film materials will be addressed covering nucleation and growth control of thin film m
Autor:
Hsin-Yi Lee, L. Matay, P. Hrkut, Peter Hudek, Ulf Kleineberg, Eva Majkova, Ulrich Heinzmann, Kostic, L. Dreeskornfeld, Stefan Luby, G. Haindl, Burkhard E. Volland, F. Shi, Ivo W. Rangelow
Publikováno v:
Thin Solid Films. 458:227-232
Recently, Mo/Si multilayer reflectors have been gaining industry interest as a promising choice for the next generation extreme ultraviolet mask material for printing sub 70 nm feature size devices. A reactive ion etching system with optimized hardwa
Autor:
Peter Hudek, O. Wehmeyer, G. Haindl, Ivan Kostic, S. Rahn, Ulrich Heinzmann, Ulf Kleineberg, R. Segler, Eva Majkova, L. Dreeskornfeld
Publikováno v:
Microelectronic Engineering. 54:303-314
Reactive Ion Etching (RIE) of Mo/Si multilayers (MLs) with double layer thicknesses of about 10 nm and total layer thicknesses between 80 nm and 300 nm prepared by electron beam deposition onto Si or oxidized Si substrates was investigated in a fluor
Autor:
Stefan Luby, A. Klipp, Peter Jutzi, G. Haindl, A Aschentrup, Ulrich Heinzmann, Aleksei Anopchenko, Matej Jergel, Jan-Michael Schmalhorst, Ulf Kleineberg, Frank Hamelmann, Eva Majkova
Publikováno v:
Thin Solid Films. 358:90-93
Molybdenum oxide/silicon oxide and tungsten oxide/silicon oxide: multilayer with 24 periods and a period thickness of 9.2 nm were fabricated with plasma-enhanced MOCVD. The layer thickness was controlled by an in situ soft X-ray reflectivity measurem
Autor:
G. Haindl, Ulrich Heinzmann, Ulf Kleineberg, Stefan Luby, R. Senderak, V. Holy, Matej Jergel, Frank Hamelmann, Eva Majkova
Publikováno v:
Journal of Applied Physics. 81:2229-2235
W1-xSix/Si multilayers (MLs) (x less than or equal to 0.66) were deposited onto oxidized Si substrates, heat treated by rapid thermal (RTA) and standard furnace annealing up to 1000 degrees C for 30 s and 25 min, respectively, and analyzed by various
Autor:
G. Haindl, S. H. A. Petri, Ulf Kleineberg, Frank Hamelmann, Peter Jutzi, J. Hartwich, A. Klipp, Ulrich Heinzmann
Publikováno v:
Organosilicon Chemistry Set: From Molecules to Materials
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a2ad2cafa58411859aaf007c1a36e15c
https://doi.org/10.1002/9783527619917.ch122
https://doi.org/10.1002/9783527619917.ch122
Autor:
Y.C. Lim, T. Westerwalbesloh, Ulf Kleineberg, A Aschentrup, Ulrich Heinzmann, O. Wehmeyer, G. Haindl
Our aim was to produce EUV multilayer mirrors with a small spectral bandwidth DeltaE less than or equal to 3 eV at 70 eV peak energy using UHV electron beam evaporation by varying the thickness ratio (Gamma = d(Abs)/d(Sp) + d(Abs)) between the absorb
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7a2a4392b85bc9d47ea28ea7ab446181
https://pub.uni-bielefeld.de/record/1618213
https://pub.uni-bielefeld.de/record/1618213