Zobrazeno 1 - 10
of 1 020
pro vyhledávání: '"G. Haacke"'
Autor:
Bowern, Claire
Publikováno v:
Language, 2002 Mar 01. 78(1), 201-202.
Externí odkaz:
https://www.jstor.org/stable/3086683
Autor:
Fan, Jiajun1 (AUTHOR), Wan, Tao1 (AUTHOR) tao.wan@unsw.edu.au, He, Yilin2 (AUTHOR), Liu, Chao1 (AUTHOR), Mei, Tingting1 (AUTHOR), Kuo, Yu‐Chieh1 (AUTHOR), Feng, Ziheng1 (AUTHOR), Guan, Peiyuan1 (AUTHOR) peiyuan.guan@unsw.edu.au, Lin, Chun‐Ho1 (AUTHOR), Li, Mengyao1 (AUTHOR), Fu, Lin3 (AUTHOR), Tao, Mengdie3 (AUTHOR), Lin, Tongxi1 (AUTHOR), Han, Zhaojun4,5,6 (AUTHOR), Tang, Jianbo4 (AUTHOR), Xu, Yeqing7 (AUTHOR), Wang, Caiyun7 (AUTHOR), Zhang, Jin2 (AUTHOR), Joshi, Rakesh1 (AUTHOR) r.joshi@unsw.edu.au, Chu, Dewei1 (AUTHOR)
Publikováno v:
Small Structures. Dec2024, Vol. 5 Issue 12, p1-12. 12p.
Publikováno v:
Journal of Coatings Technology. 71:87-94
Hindered amine light stabilizers (HALS) and UV absorbers (UVA) added to pigmented coatings adsorb on certain pigment and ultrafine oxide particles. Analysis of adsorption isotherms taken in xylene solutions and spectroscopic data revealed that chemis
Publikováno v:
Analytical Chemistry. 70:3762-3765
The depth distribution of light stabilizers in coatings has been investigated by analyzing the stabilizer content of microtomed slices cut parallel to the coating surface. The analytical technique consists of extracting the unbound light stabilizers
Publikováno v:
Progress in Organic Coatings. 34:75-83
Adsorption experiments have been carried out to understand the interactions responsible for UV light stabilizer adsorption on pigments in coatings. Light stabilizer adsorption on various pigments was studied in xylene solutions to eliminate potential
Publikováno v:
Journal of Applied Physics. 75:2952-2956
Very high purity n‐type GaAs epilayers were grown by low pressure metalorganic chemical vapor deposition using triethylgallium and tertiarybutylarsine (TBA) or arsine (AsH3). Peak Hall mobilities of 209 000 cm2/V s at 45 K were observed for growth
Publikováno v:
Journal of Applied Physics. 72:2797-2801
Residual donor and acceptor species were studied in a series of high purity n‐type InP epilayers grown by metalorganic chemical vapor deposition using tertiarybutylphosphine and trimethylindium (TMIn). Over the entire range of growth conditions, th
Autor:
S. P. Watkins, G. Haacke
Publikováno v:
Journal of Applied Physics. 69:1625-1630
Magnetophotoluminescence spectroscopy (MPL) has been used to ascertain the source of donor impurities in high‐purity GaAs grown by atmospheric pressure metalorganic vapor deposition using arsine and trimethylgallium. A linear correlation between ab
Publikováno v:
Journal of Crystal Growth. 107:342-347
Metalorganic chemical vapor deposition was used to grow unintentionally doped GaAs epitaxial layers and compare the properties of arsine- and tertiarybutylarsine-grown layers. Nearly identical electrical transport properties were found when the galli