Zobrazeno 1 - 10
of 71
pro vyhledávání: '"G. Gautherin"'
Publikováno v:
ChemInform. 22
Publikováno v:
Applied Surface Science. 53:353-357
WN x thin films (0.5⩽ x ⩽1) were deposited at room temperature on clean silicon substrates by reactive ion-beam sputter deposition in an UHV set-up. Properties such as morphology, microstructure, density, composition, mechanical stress and resist
Publikováno v:
Journal of The Electrochemical Society. 138:1084-1089
Oxidation kinetics of silicon nitride films in wet oxygen at 900 and 1000°C, deposited at room temperature by ion-beam sputtering is studied. Two compositions of Si x N y were used: quasistoichiometric (N/Si=1.4) and silicon-rich (N/Si=0.8). The res
Publikováno v:
Journal of Applied Physics. 68:2780-2790
We have studied boron nitride films deposited at room temperature by ion‐beam‐assisted deposition in an ultrahigh vacuum apparatus, with ion accelerating voltages ranging between 0.25 and 2 kV. By using complementarily in situ Auger electron spec
Publikováno v:
Thin Solid Films. :181-188
Almost all plasma- and ion-beam-based deposition techniques involve energetic particle bombardment of the growing film and lead to a more or less significant incorporation of noble gas. This incorporation is considered by most researchers to have a n
Publikováno v:
Thin Solid Films. 184:117-123
The first results are reported on Si1−xGex epitaxial layers grown on Si(100) by ion beam sputter deposition in ultrahigh vacuum. Growth temperatures were varied from 300 to 700°C, for compositions in the range 0.05 < x < 0.5. The properties of the
Publikováno v:
Interaction of Charged Particles with Solids and Surfaces ISBN: 9781468480283
This paper reports the results on a study of rare-gas incorporation in films deposited by ion beam sputter deposition (IBSD). It has been observed that electrical properties of metallic and semiconductor films depend on the nature and concentration o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b37d6e0b96f7c4875ebe08942abe88b
https://doi.org/10.1007/978-1-4684-8026-9_42
https://doi.org/10.1007/978-1-4684-8026-9_42
Publikováno v:
Japanese Journal of Applied Physics. 30:1469
Optical properties and mechanical stress of silicon nitride films deposited at room temperature by ion-beam sputtering are studied for various compositions in the range of N/Si=0.6 to N/Si=1.4. The refractive index and mechanical stress are investiga
Autor:
C Lejeune, G Gautherin
Publikováno v:
Vacuum. 34:251-257
An ion source is presented which produces a continuous, uncontaminated, high current (1–100 ωA) beam of arsenic with a high charge utilization efficiency. The main advantages of this source are related to two unique features: (1) the unmagnetized