Zobrazeno 1 - 10
of 29
pro vyhledávání: '"G. Frankowsky"'
Publikováno v:
Materials Science and Engineering: B. 43:201-206
We have studied the optical gain spectra in GalnN/GaN and GaN/AlGaN double heterostructures and quantum wells at room temperature employing the stripe-excitation method. We compare the results with data for other III–V semiconductors. The optical g
Publikováno v:
Journal of Crystal Growth. 145:242-248
Selective area growth of GaInAs has been performed by low pressure metalorganic vapor phase epitaxy (MOVPE) on SiO 2 -masked InP substrates. The growth rate and composition variations induced by the mask pattern have been evaluated by cathodoluminesc
Publikováno v:
Superlattices and Microstructures. 7:309-313
Differential electrotransmission measurements on InGaAs/InP and InGaAs/InGaAsP multi quantum well structures (MQW) with well widths 8,10 and 20 nm with InGaAsP barriers of E g (77 K ) = 1.2 eV are presented. The differential electrotransmission spect
Publikováno v:
Applied Physics Letters. 68:3746-3748
By optical gain spectroscopy we have studied the fundamental laser properties of GaInN/GaN heterostructures grown on sapphire. Utilizing the stripe excitation method we have measured optical gain spectra at room temperature. Due to the low symmetry o
Autor:
T. Kirihata, G. Mueller, B. Ji, G. Frankowsky, J. Ross, H. Terletzki, D. Netis, O. Weinfurtner, D. Hanson, G. Daniel, L. Hsu, D. Storaska, A. Reith, M. Hug, K. Guay, M. Selz, P. Poechmueller, H. Hoenigschmid, M. Wordeman
Publikováno v:
1999 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. ISSCC. First Edition (Cat. No.99CH36278).
Autor:
H. Hoenigschmid, A. Frey, J. DeBrosse, T. Kirihata, G. Mueller, G. Daniel, G. Frankowsky, K. Guay, D. Hanson, L. Hsu, B. Ji, D. Netis, S. Panaroni, C. Radens, A. Reith, D. Storaska, H. Terletzki, O. Weinfurtner, J. Alsmeier, W. Weber, M. Wordeman
Publikováno v:
1999 Symposium on VLSI Circuits. Digest of Papers (IEEE Cat. No.99CH36326).
A 7F/sup 2/ DRAM cell and corresponding vertically folded bitline architecture has been fabricated using a 0.175 /spl mu/m CMOS technology. This concept features an advanced 30/spl deg/ tilted array device layout and an area penalty free inter BL twi
Publikováno v:
Applied Physics Letters. 64:854-856
GaInAs layers were grown selectively on partially masked InP substrates by metalorganic vapor phase epitaxy using the conventional In precursor trimethyl‐indium (TMI) and the intramolecularly saturated compound dimethylaminopropyl‐dimethyl‐indi
Publikováno v:
1993 (5th) International Conference on Indium Phosphide and Related Materials.
The authors have studied the combination of the two alternative precursors DADI (dimethylaminopropyl-dimethylindium) and tertiary-butyl-arsine (TBA) in atmospheric pressure metalorganic vapor phase epitaxy of GaInAs lattice matched to InP. They could
Publikováno v:
Scopus-Elsevier
Using spatially and spectrally resolved low-temperature cathodoluminescence, we have investigated GaInAs/InP quantum wells grown by selective epitaxy. For quantum wells with a nominal thickness of 0.6 nm we observe a splitting of the luminescence int
Publikováno v:
Scopus-Elsevier
We investigated optical properties (cathodoluminescence linescans) of selectively deposited quantum wells. As expected for selective MOVPE, composition and growth rate of bulk layers and quantum wells with thicknesses above 6 nm are determined by gas