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pro vyhledávání: '"G. F. C. Almeida"'
Autor:
G. F. C. Almeida, T. Sugahara, A. A. Arbex, A. A. Couto, M. Massi, F. E. Montoro, D. A. P. Reis
Publikováno v:
Materials Research, Vol 23, Iss 6 (2020)
Abstract This paper compares the creep behavior of Ti-6Al-4V alloy after different surface treatments, the plasma nitriding using Plasma Enhanced Chemical Vapor Deposition (PECVD), and the deposition of SiC thin films with Cr interlayer using High Po
Externí odkaz:
https://doaj.org/article/fdf602225ece4cf493cb8122ff4b2e59
