Modelagem dos processos químicos em plasmas de misturas gasosas usadas na corrosão de silício. Parte 2: SF6 / O2

Autor: G. F. Bauerfeldt, G. Arbilla

Publikováno v: Química Nova, Vol 21, Iss 1, Pp 34-42 (1998)

Externí odkaz: https://doaj.org/article/4fd88f8afb2948d0a514081888c09a4d

Modeling of the chemical processes in the plasma of gaseous mixtures used in the etching of silicon. Part 2: SF6 / O2

Autor: G. F. Bauerfeldt, G. Arbilla

Publikováno v: Química Nova, Vol 21, Iss 1, Pp 34-42 (1998)
Química Nova v.21 n.1 1998
Química Nova
Sociedade Brasileira de Química (SBQ)
instacron:SBQ
Química Nova, Volume: 21, Issue: 1, Pages: 34-42, Published: FEB 1998

In this work, a numerical modeling analysis of the gas-phase decomposition of SF6 / O2 mixtures, in the presence of silicon, was performed. The relative importance of individual processes and the effect of the parameters' uncertainties were determine

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b3a454911b2225ca7c0ccf2baf450a82
http://www.scielo.br/pdf/qn/v21n1/3466.pdf