Výsledky vyhledávání - "G. F. Bauerfeldt"

Akademický článek

Unravelling the Epitaxial Growth Mechanism of Hexagonal and Nanoporous Boron Nitride: A First-Principles Microkinetic Model.

Autor: Payne AJR; School of Chemistry and Chemical Engineering, University of Surrey, GU2 7XH, Guildford, UK., Jr NFX; School of Chemistry and Chemical Engineering, University of Surrey, GU2 7XH, Guildford, UK., Tamtögl A; Institute of Experimental Physics, Graz University of Technology, Graz, 8010, Austria., Sacchi M; School of Chemistry and Chemical Engineering, University of Surrey, GU2 7XH, Guildford, UK.

Publikováno v: Small (Weinheim an der Bergstrasse, Germany) [Small] 2025 Jan 05, pp. e2405404. Date of Electronic Publication: 2025 Jan 05.

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Modeling of the chemical processes in the plasma of gaseous mixtures used in the etching of silicon. Part 2: SF6 / O2

Autor: G. F. Bauerfeldt, G. Arbilla

Publikováno v: Química Nova, Vol 21, Iss 1, Pp 34-42 (1998)
Química Nova v.21 n.1 1998
Química Nova
Sociedade Brasileira de Química (SBQ)
instacron:SBQ
Química Nova, Volume: 21, Issue: 1, Pages: 34-42, Published: FEB 1998

In this work, a numerical modeling analysis of the gas-phase decomposition of SF6 / O2 mixtures, in the presence of silicon, was performed. The relative importance of individual processes and the effect of the parameters' uncertainties were determine

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b3a454911b2225ca7c0ccf2baf450a82
http://www.scielo.br/pdf/qn/v21n1/3466.pdf

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Modelagem dos processos químicos em plasmas de misturas gasosas usadas na corrosão de silício. Parte 1: CF4 / O2

Autor: Graciela Arbilla, G. F. Bauerfeldt

Publikováno v: Química Nova, Vol 21, Iss 1, Pp 25-33 (1998)
Química Nova v.21 n.1 1998
Química Nova
Sociedade Brasileira de Química (SBQ)
instacron:SBQ
Química Nova, Volume: 21, Issue: 1, Pages: 25-33, Published: FEB 1998

The plasma etching of semiconductor surfaces with fluorine-containing compounds has technological interest. Presently, considerable effort is being devoted to understand the chemistry involved. In this work, a numerical modeling analysis of the gas-p

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a764ed9092e89abf44d160a4bcd230e2
http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0100-40421998000100005

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Akademický článek

Photodissociation and formation of an ion-pair in CH 2 FCl (HCFC-31).

Autor: Silva AJFWHS; Chemistry Department, Universidade Federal da Paraíba, Joao Pessoa, Brazil., Rodrigues GP; Chemistry Department, Universidade Federal da Paraíba, Joao Pessoa, Brazil., Ventura E; Chemistry Department, Universidade Federal da Paraíba, Joao Pessoa, Brazil., do Monte SA; Chemistry Department, Universidade Federal da Paraíba, Joao Pessoa, Brazil.

Publikováno v: Journal of computational chemistry [J Comput Chem] 2024 Mar 30; Vol. 45 (8), pp. 476-486. Date of Electronic Publication: 2023 Nov 11.

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Akademický článek

Reactivity of Isocyanate Radical with Formic Acid in the Tropospheric and Outer Space Regions: A DFT and MP2 Investigation in Gaseous Phase.

Autor: Kabanda, Mwadham M.¹ (AUTHOR) Mwombeki.Kabanda@univen.ac.za, Bahadur, Indra² (AUTHOR) bahadur.indra@nwu.ac.za, Singh, Prashant³ (AUTHOR), Mohammad, Faruq⁴ (AUTHOR), Soleiman, Ahmed Abdullah⁵ (AUTHOR)

Publikováno v: ChemistrySelect. 12/22/2023, Vol. 8 Issue 48, p1-18. 18p.

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