Zobrazeno 1 - 10
of 42
pro vyhledávání: '"G. Derst"'
Publikováno v:
Berichte der Bunsengesellschaft für physikalische Chemie. 101:1258-1264
With recent developments in solid state detectors combined with X-rays at glancing angles of incidence, Extended X-ray Absorption Fine Structure (EXAFS) experiments on arsenic ion-implanted into amorphous silicon surfaces have been obtained at diluti
Autor:
S. Kalbitzer, Andrew J. Dent, G. Derst, G.N. Greaves, B. R. Dobson, Gerhard Krötz, Gerhard Müller, W. Hellmich
Publikováno v:
Philosophical Magazine B. 73:245-259
Substitutional (B, P, As and Ga) and interstitial (K) dopants have been incorporated into H‐free amorphous Si (a‐Si) films produced by ion beam amorphization of crystalline silicon material. X‐ray absorption fine‐structure, photothermal defle
Publikováno v:
Applied Physics A Materials Science and Processing. 61:193-201
Fine-grained (d≈0.1 μm), polycrytalline SiC films were prepared on top of insulating and optically transparent sapphire substrates by means of a thermal crystallization technique. Optical absorption measurements indicate that the individual SiC gr
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 97:426-429
Using a newly developed reflectometer we have measured the reflectivity of crystalline silicon and SiO x coated float glass at the silicon K absorption edge. The reflectometer can be used without the need for ultra high vacuum. The critical angle of
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 97:312-315
To detect changes in the environment of the lattice constituents in ion beam amorphized Si material at various stages of annealing glancing angle X-ray absorption fine structure (XAFS) measurements at the Si K-edge were performed. The recrystallisati
Publikováno v:
Materials Science and Engineering: B. 29:147-150
Fine-grained (d ≈ 0.1 μm), polycrystalline (pc) SiC films were prepared on top of insulating and optically transparent sapphire substrates by a thermal crystallization technique (SiCOS films). Unlike high-temperature deposited pc-SiC films, SiCOS
Publikováno v:
Radiation Effects and Defects in Solids. 128:341-355
Optical reflection spectra and their derivatives of Ar+ ion (75 keV) bombarded single crystals of Si and GaAs, with fluence ranging from 5 × 1011-1 × 1015 ions cm−2, have been investigated in the spectral region of interband optical transitions.
Publikováno v:
Diamond and Related Materials. 3:917-921
Thin-film SiC in its various crystalline (c-) and amorphous (a-) forms exhibits a number of properties which make these materials interesting for optical and optoelectronic applications. This paper describes the preparation and properties of such fil
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :927-930
Ion implantation doping experiments have been performetion fine-grained, polycrystalline SiC films deposited onto insulating and optically transparent sapphire substrates. The efficiency of implantation doping has been found to be critically dependen
Publikováno v:
Materials Science and Engineering: B. 11:79-82
Thin crystalline films of SiC have been produced by ion beam modification of heteroepitaxial silicon thin films on sapphire and by plasma-enhanced chemical vapour deposition on crystalline silicon and sapphire substrates. Both methods yield highly tr