Zobrazeno 1 - 10
of 16
pro vyhledávání: '"G. Bleidiessel"'
Autor:
C. M. Sotomayor Torres, C. Clavijo Cedeño, G. Bleidiessel, J. Seekamp, S. Zankovych, Gabi Gruetzner, K. Pfeiffer, A. P. Kam, T. Hoffmann, Jouni Ahopelto, Freimut Reuther, Mikhail V. Maximov, B Heidari
Publikováno v:
Scopus-Elsevier
ResearcherID
Sotomayor Torres, C M, Zankovych, S, Seekamp, J, Kam, A P, Cedeño, C C, Hoffmann, T, Ahopelto, J, Reuther, F, Pfeiffer, K, Bleidiessel, G, Gruetzner, G, Maximov, M V & Heidari, B 2003, ' Nanoimprint lithography : An alternative nanofabrication approach ', Materials Science and Engineering C: Materials for Biological Applications, vol. 23, no. 1-2, pp. 23-31 . https://doi.org/10.1016/S0928-4931(02)00221-7
ResearcherID
Sotomayor Torres, C M, Zankovych, S, Seekamp, J, Kam, A P, Cedeño, C C, Hoffmann, T, Ahopelto, J, Reuther, F, Pfeiffer, K, Bleidiessel, G, Gruetzner, G, Maximov, M V & Heidari, B 2003, ' Nanoimprint lithography : An alternative nanofabrication approach ', Materials Science and Engineering C: Materials for Biological Applications, vol. 23, no. 1-2, pp. 23-31 . https://doi.org/10.1016/S0928-4931(02)00221-7
A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent develo
Publikováno v:
Microelectronic Engineering. :381-387
Driven by the steadily increasing scale of integration in microelectronics much effort has been made in recent years to establish the technique of nanoimprint lithography (NIL) as a promising approach to time and cost-effective fabrication of nanomet
Autor:
Ch. Cardinaud, G. Bleidiessel, Gabi Gruetzner, Hella-Christin Scheer, C. M. Sotomayor Torres, F. Gaboriau, K. Pfeiffer, T. Hoffmann, M. Fink, H. Schulz
Publikováno v:
Microelectronic Engineering. 53:411-414
Aromatic polymers based on methacrylates (linear polymers) and multifunctional allylesters (crosslinked polymers) have been prepared. They feature high dry etch resistance and good imprintability in a hot embossing process. The crosslinked polymers a
Publikováno v:
Microelectronic Engineering. :433-436
Interest in thick photoresist applications is steadily growing. Specialised equipment has been developed to cope with the new challenges to process and pattern extremely thick photoresist layers. A decisive step in the preparation of resist layers is
Autor:
Hella-Christin Scheer, K. Pfeiffer, G. Bleidiessel, Jouni Ahopelto, D. Lyebyedyev, H. Schulz, G. Grützner
Publikováno v:
Schulz, H, Lyebyedev, D, Scheer, H-C, Pfeiffer, G, Bleidiessel, G, Grützner, D & Ahopelto, J 2000, ' Master replication into thermosetting polymers for nanoimprinting ', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 6, pp. 3582-3585 . https://doi.org/10.1116/1.1319821
Replication of the e-beam master into thermosetting polymers was investigated for low cost working stamp fabrication for nanoimprint lithography (NIL). Negative as well as positive replicas from a master were fabricated in a thermal replication step
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::de31048988c165548d65c71342cb2f40
https://cris.vtt.fi/en/publications/e68e1af2-32ae-46f5-9e9f-8d804c9301fb
https://cris.vtt.fi/en/publications/e68e1af2-32ae-46f5-9e9f-8d804c9301fb
Autor:
Ch. Cardinaud, G. Grützner, M. C. Peignon, K. Pfeiffer, C. M. Sotomayor Torres, B Heidari, T. Hoffmann, F. Gaboriau, Jouni Ahopelto, Hella-Christin Scheer, H. Schulz, G. Bleidiessel
Publikováno v:
Schulz, H, Scheer, H-C, Hoffmann, T, Sotomayor-Torres, C, Pfeiffer, K, Bleidiessel, G, Grutzner, G, Cardinaud, C, Gaboriau, F, Peignon, M-C, Ahopelto, J & Heidari, B 2000, ' New polymer materials for nanoimprinting ', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 4, pp. 1861-1865 . https://doi.org/10.1116/1.1305331
We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a sel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d44a73b1c765942ee6836a7e4a2ff6b8
https://cris.vtt.fi/en/publications/b98d8102-1136-4e1b-92ee-b8fa4424048f
https://cris.vtt.fi/en/publications/b98d8102-1136-4e1b-92ee-b8fa4424048f
Autor:
T. Hoffmann, Hella-Christin Scheer, Gabi Gruetzner, H. Schulz, G. Bleidiessel, Jouni Ahopelto, C. M. Sotomayor Torres, K. Pfeiffer
Publikováno v:
Pfeiffer, K, Bleidiessel, G, Gruetzner, G, Shultz, H, Hoffmann, T, Scheer, H-C, Sotomayor-Torres, C & Ahopelto, J 1999, ' Suitability of new polymer materials with adjustable glass temperature for nano-imprinting ', Microelectronic Engineering, vol. 46, no. 1-4, pp. 431-434 . https://doi.org/10.1016/S0167-9317(99)00126-4
A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The resul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0c8e63a145b8264471f3f0e901ebc28d
https://cris.vtt.fi/en/publications/a08a65c8-d8e7-4457-9f08-6b6e79861a9e
https://cris.vtt.fi/en/publications/a08a65c8-d8e7-4457-9f08-6b6e79861a9e
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