Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Günther Derra"'
Autor:
Günther Derra, Holger Moench
Publikováno v:
Laser Technik Journal. 11:43-47
New high power infrared sources in the kilowatt range are based on modular building blocks of LED-like microlaser arrays. Modules in a very compact form factor enable easy integration in industrial heating processes. Fully flexible and dynamic contro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed18850ed795c63f5696772e3c4fcab9
https://doi.org/10.1002/latj.201400024
https://doi.org/10.1002/latj.201400024
Autor:
Jeroen Jonkers, Rolf Wester, Günther Derra, Klaus Bergmann, Joseph Pankert, Thomas Krücken, Willi Neff, Dominik Marcel Vaudrevange, Stefan Seiwert, Oliver Rosier, Rolf Apetz, Peter Zink, Guido Siemons, Jürgen Klein, Sven Probst, Christopher Smith, Michael Loeken
The light source has been identified as being the most critical single component on the way to realizing EUVL. The requirements on the source are derived from a throughput model for the processing of up to 120 wafers per hour in a commercial EUV scan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a4a7fa5817fed0ace52288703cda14d
https://doi.org/10.1117/3.613774.ch13
https://doi.org/10.1117/3.613774.ch13
Autor:
Jeroen Jonkers, Guido Schriever, Sven Götze, Masaki Yoshioka, Günther Derra, Rob Snijkers, Rainer Müller, Max C. Schürmann, Jürgen Dr. Kleinschmidt, Denis Bolshukhin, Peter Zink, Marc Corthout
Publikováno v:
Alternative Lithographic Technologies.
The learning gained in previous developments for EUV Micro Exposure and Alpha Tools builds the basis for the EUVL source development at XTREME technologies and Philips EUV. Field data available from operation of these tools are in use for continuous
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f96943a5ce3ac5fae1d1b109e95abf5a
https://doi.org/10.1117/12.814100
https://doi.org/10.1117/12.814100
Autor:
Max C. Schürmann, Peter Zink, Günther Derra, Erik Wagenaars, Marc Corthout, Hans Scheuermann, Guido Schriever, Jeroen Jonkers, Rolf Apetz, Guido Seimons, Marcel Damen, Peiter van de Wel, Rob Snijkers, Jesko Dr. Brudermann, Jürgen Klein, Masaki Yoshioka, Willi Neff, Oliver Franken, Oliver Zitzen, Dominik Marcel Vaudrevange, Felix Küpper, Arnaud Mader
Publikováno v:
SPIE Proceedings.
For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d8e8a04b4a2de39e064683cab332b4a
https://doi.org/10.1117/12.772633
https://doi.org/10.1117/12.772633
Autor:
Willi Neff, Oliver Franken, Andreas List, Marcel Damen, Oliver Zitzen, Maurice Janssen, Klaus Bergmann, Joseph Pankert, Helmar Kraus, Peter Zink, Dominik Marcel Vaudrevange, Dirk Wagemann, Thomas Krücken, Stefan Schwabe, Micheal Loeken, Stefan Seiwert, Rolf Apetz, Oliver Rosier, Günther Derra, Christof Metzmacher, Ralph Prummer, Achim Weber, Jeroen Jonkers, Arnaud Mader, Sven Probst, Guido Siemons, Jürgen Klein
Publikováno v:
SPIE Proceedings.
In this paper, we report on the recent progress of the Philips Extreme UV source. The Philips source concept is based on a discharge plasma ignited in a Sn vapor plume that is ablated by a laser pulse. Using rotating electrodes covered with a regener
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02052cc3f501f7ec7b98a546edfd7b4f
https://doi.org/10.1117/12.657066
https://doi.org/10.1117/12.657066
Autor:
Holger Mönch, Günther Derra, Achim Körber, Carsten Deppe, Arnd Ritz, Ulrich Weichmann, Folke‐Charlotte Nörtemann, Hermann Giese, Thomas Krücken, Ulrich Niemann, Mark Carpaij, Jens Pollmann-Retsch, Ulrich Hechtfischer, Johannes Baier, Uwe Mackens, Pavel Pekarski
Publikováno v:
Journal of the Society for Information Display. 15:789
— Projection systems have found widespread use in conference rooms and other professional applications during the last decade and are now entering the home-TV market with considerable pace. Projectors as small as about one liter are nowadays able t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c237b4fff657a60d2f1a170c4c93cf2
https://doi.org/10.1889/1.2798817
https://doi.org/10.1889/1.2798817
Publikováno v:
SID Symposium Digest of Technical Papers. 30:1076
The fast developments in projection display technology require a corresponding development of short arc lamps. Arc length and high luminance determine light collection rather than lamp power. The new UHP lamps combine highest brightness, extremely lo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::48ccfc0d4ffddccc023a420739ab40a1
https://doi.org/10.1889/1.1833953
https://doi.org/10.1889/1.1833953
Autor:
DERRA, GÜNTHER1 guenther.derra@philips.com
Publikováno v:
Industrial Laser Solutions for Manufacturing. Mar/Apr2015, Vol. 30 Issue 2, p15-19. 4p.
Publikováno v:
Laser Technik Journal; Apr2014, Vol. 11 Issue 2, p18-29, 12p
Autor:
Moench, Holger, Derra, Günther
Publikováno v:
Laser Technik Journal; Apr2014, Vol. 11 Issue 2, p43-47, 5p