Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Fumiyuki Nishiyama"'
Publikováno v:
Journal of Photopolymer Science and Technology. 29:479-487
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5efbc6f8edd9f6b1a49104c142f81cb5
https://doi.org/10.2494/photopolymer.29.479
https://doi.org/10.2494/photopolymer.29.479
Publikováno v:
Journal of Photopolymer Science and Technology. 20:333-338
It is generally believed that the chemically amplified reaction between photo-generated acid catalyst and acid labile group of polymer during post-exposure bake (PEB) process plays a critical role for the reduction of line width roughness (LWR) in Ar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d14bc8ec00fe1a8bc91af30f4dcf3283
https://doi.org/10.2494/photopolymer.20.333
https://doi.org/10.2494/photopolymer.20.333
Autor:
Fumiyuki Nishiyama, Tsukasa Yamanaka, Kenichiro Sato, Kunihiko Kodama, Tadayoshi Kokubo, Makoto Momota, Shinnichi Kanna, Shiro Tan, Yasumasa Kawabe, Hyou Takahashi
Publikováno v:
Journal of Photopolymer Science and Technology. 17:501-509
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59cdbb9f08884529bb1b9087551f9609
https://doi.org/10.2494/photopolymer.17.501
https://doi.org/10.2494/photopolymer.17.501
Publikováno v:
SPIE Proceedings.
It is generally believed that the chemically amplified reaction between photo-generated acid catalyst and acid labile group of polymer during post-exposure bake (PEB) process plays a critical role for the reduction of line width roughness (LWR) in Ar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::26bd42a09ed2cf5fd7b9eafd5a30c149
https://doi.org/10.1117/12.712157
https://doi.org/10.1117/12.712157
Autor:
Yasumasa Kawabe, Makoto Momota, Shinichi Kanna, Kunihiko Kodama, Fumiyuki Nishiyama, Tadayoshi Kokubo, Kenichiro Sato, Hyou Takahashi, Shiro Tan, Tsukasa Yamanaka
Publikováno v:
SPIE Proceedings.
Transparency of the resist film at exposure wavelength affects lithographic performances, such as sensitivity, profile and resolution. Not only binder polymer, but also photo acid generator (PAG) itself has a significant impact on transparency of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dae3c3e7ddb9c59c5405b038db5cd40f
https://doi.org/10.1117/12.538049
https://doi.org/10.1117/12.538049
Autor:
Yasumasa Kawabe, Tadayoshi Kokubo, Lawrence Ferreira, Fumiyuki Nishiyama, Shinji Sakaguchi, Andrew J. Blakeney, Shiro Tan
Publikováno v:
SPIE Proceedings.
Effects of a dissolution promoter (DP) on the lithographic behavior of DNQ-novolac resists were investigated. The key structure/property relationships of the DP in relation to other parameters of the resist components were identified. In this work, w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c484b193cd7a4be99c01da04ee8d79b
https://doi.org/10.1117/12.241841
https://doi.org/10.1117/12.241841
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