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pro vyhledávání: '"Fumio Mural"'
Autor:
Shinji Okazaki, Hiroshi Shiraishi, Jiro Yamamoto, Fumio Mural, Shou-ichi Uchino, Tsuneo Terasawa, Toshiyuki Yoshimura
Publikováno v:
Journal of Photopolymer Science and Technology. 10:629-634
We describe how molecular-weight distributions of resist polymers and process control affect lithography for 0.1μm and below, especially for negative-type resists. There are two main issues for precise critical dimension (CD) control and high resolu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bb954e24641eaa2b75fdb5e7079ca977
https://doi.org/10.2494/photopolymer.10.629
https://doi.org/10.2494/photopolymer.10.629
