Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Fumiko Ota"'
Publikováno v:
SPIE Proceedings.
A negative-CAR for EB reticle fabrication beyond 100 nm node is needed, which is superior in performance such as resolution, sensitivity, pattern quality, CD movement by process delays (PCD, PED) and process latitudes. We started preliminary screenin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b106542a3a0003347ae52732d616e08
https://doi.org/10.1117/12.476945
https://doi.org/10.1117/12.476945
Publikováno v:
21st Annual BACUS Symposium on Photomask Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d47f3dbe8b9e90d1030ca2d5d2d9d6b3
https://doi.org/10.1117/12.458350
https://doi.org/10.1117/12.458350
Publikováno v:
SPIE Proceedings.
This paper will describe resist screening results for iP3500/3600 replacement for the advanced laser reticle fabrication, resist coating thickness optimization proposal for the next generation as well. THMR-M100 (TOK) showed the best pattern profile
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc6645f209b32b17b1ec23d614df3e77
https://doi.org/10.1117/12.410737
https://doi.org/10.1117/12.410737
Autor:
Yasunori Yokoya, Hideo Kobayashi, Takao Higuchi, Keishi Asakawa, Akinori Kurikawa, Tadashi Sakurai, Masahiro Hashimoto, Fumiko Ota
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::10bf0c506d5f672c08ff108f8d1dbfcd
https://doi.org/10.1117/12.377099
https://doi.org/10.1117/12.377099