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pro vyhledávání: '"Fumihiko Higuchi"'
Autor:
Bill Banke, Merritt Funk, Wesley C. Natzle, Dan Prager, Charles N. Archie, Jason Ferns, Matthew Sendelbach, Dan Engelhard, Fumihiko Higuchi, Asao Yamashita, Masayuki Tomoyasu
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
As feature geometries decrease, the budgeted error for process variations decreases as well. Keeping these variations within budget is especially important in the area of gate linewidth control. Because of this, wafer-to-wafer control of gate linewid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a080ff9f40764595333b5c0fae42227
https://doi.org/10.1117/12.537969
https://doi.org/10.1117/12.537969
