Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Fumiharu Nakajima"'
Autor:
Yayori Abe, Yuki Watanabe, Toshiya Kotani, Masanari Kajiwara, Shigeki Nojima, Fumiharu Nakajima
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XII.
In recent years, various methods for hotspot detection during optical proximity correction (OPC) verification have been studied. They try to predict hotspots by analyzing optical features of aerial image such as peak intensity. However, detection acc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd0a7f4ede43900238e63f53abe96c01
https://doi.org/10.1117/12.2297189
https://doi.org/10.1117/12.2297189
Autor:
Toshiya Kotani, Fumiharu Nakajima, Shigeki Nojima, Hirotaka Ichikawa, Atsushi Takahashi, Takeshi Ihara, Koichi Nakayama, Chikaaki Kodama
Publikováno v:
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 34:753-765
Although self-aligned double and quadruple patterning (SADP, SAQP) have promising processes for sub-20 nm node advanced technologies and beyond, not all layouts are compatible with them. In advanced technologies, feasible wafer image should be genera
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8e7c571ca3ff491d32c340a29d874712
https://doi.org/10.1109/tcad.2015.2404878
https://doi.org/10.1109/tcad.2015.2404878
Publikováno v:
SPIE Proceedings.
Self-Aligned Quadruple Patterning (SAQP) will be one of the leading candidates for sub-14nm node and beyond. However, compared with triple patterning, making a feasible standard cell placement has following problems. (1) When coloring conflicts occur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d47fda736a41f5d652acc48f23db75c7
https://doi.org/10.1117/12.2085705
https://doi.org/10.1117/12.2085705
Autor:
Shunsuke Ohtani, Shinro Mashiko, Fumiharu Nakajima, Nobuyuki Nakamura, Makoto Sakurai, Hiroyuki A. Sakaue, Takunori Fukumoto
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 235:519-523
Highly charged ion is useful to produce nanostructure on various materials, and is key tool to realize single ion implantation technique. On such demands for the application to nanotechnology, we have designed an electron bean ion source. The design
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb6c590c29a5e9346d4fba6086766040
https://doi.org/10.1016/j.nimb.2005.03.236
https://doi.org/10.1016/j.nimb.2005.03.236
Publikováno v:
SHINKU. 46:294-297
The structure of CH4 monolayer physisorbed on a Ag (111) surface was observed by LEED. The LEED patterns were recorded with suppressed electron current using a cooled CCD camera in order to minimize the electron stimulated desorption of adsorbed CH4.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da9dd834796fa33c79ac726871513bd7
https://doi.org/10.3131/jvsj.46.294
https://doi.org/10.3131/jvsj.46.294
Autor:
Toshiya Kotani, Koichi Nakayama, Chikaaki Kodama, Hirotaka Ichikawa, Fumiharu Nakajima, Shigeki Nojima
Publikováno v:
SPIE Proceedings.
Self-Aligned Quadruple Patterning (SAQP) is one of the most leading techniques in 14 nm node and beyond. However, the construction of feasible layout configurations must follow stricter constraints than in LELELE triple patterning process. Some SAQP
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d92d614abe801f254943de048737552c
https://doi.org/10.1117/12.2046241
https://doi.org/10.1117/12.2046241
Autor:
Toshiya Kotani, Fumiharu Nakajima, Shoji Mimotogi, Chikaaki Kodama, Shinji Miyamoto, Shigeki Nojima, Hirotaka Ichikawa, Koichi Nakayama
Publikováno v:
SPIE Proceedings.
In this paper, we propose a new flexible routing method for Self-Aligned Double Patterning (SADP). SADP is one of the most promising candidates for patterning sub-20 nm node advanced technology but wafer images must satisfy tighter constraints than l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90f654d31c8cf43f11b23821e342bafc
https://doi.org/10.1117/12.2010644
https://doi.org/10.1117/12.2010644
Autor:
Shoji Mimotogi, Hiromitsu Mashita, Toshiya Kotani, Soichi Inoue, Takafumi Taguchi, Katsumi Iyanagi, Fumiharu Nakajima
Publikováno v:
SPIE Proceedings.
Computational spacer patterning technology (SPT) has been developed for the first time to address the challenges concerning hotspots and mask specifications in SPT. A simulation combined with a lithography, etching and deposition model shows the stro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f055c43a9728d8e72599fb6f49171306
https://doi.org/10.1117/12.868940
https://doi.org/10.1117/12.868940
Publikováno v:
SPIE Proceedings.
A neural network (NN)-based approach with a lumped model is found to be much more promising to predict process proximity effects (PPEs) caused through space patterning processes than a conventional tandem-based approach with a consecutive physical mo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16b50950b4e98bd9a439ad81e02ad09e
https://doi.org/10.1117/12.813614
https://doi.org/10.1117/12.813614
Autor:
Kohji Hashimoto, Hiromitsu Mashita, Fumiharu Nakajima, Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, Kazuya Sato, Hidefumi Mukai
Publikováno v:
SPIE Proceedings.
Flow of fixing of hot spot induced by optical variation among exposure tools is discussed for quick ramp-up of high volume products. To achieve robust pattern formation for optical variation, following hot spot detection and fixing approaches are int
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7162e6ae01046ba95e08970cf5847988
https://doi.org/10.1117/12.793125
https://doi.org/10.1117/12.793125