Výsledky vyhledávání - "Fukazawa, Kazuhiko"

Periodical

Technology for high density CD measurement of EUV-processed resist patterns across a wafer ensuring high throughput and precision

Autor: Sendelbach, Matthew J., Schuch, Nivea G., Matsukata, Taeko, Fukazawa, Kazuhiko, Hirukawa, Shigeru, Mukai, Kaori, Miyazaki, Yosuke, Fujimori, Yoshihiko, Iwaki, Tomohiro, Okada, Tomonori

Publikováno v: Proceedings of SPIE; April 2024, Vol. 12955 Issue: 1 p129552O-129552O-11, 12825660p

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Periodical

High-density CD measurement technology with high throughput and high precision on the entire surface of a process wafer, capable of capturing randomly occurring CD defects

Autor: Robinson, John C., Sendelbach, Matthew J., Fukazawa, Kazuhiko, Hirukawa, Shigeru, Miyazaki, Yosuke, Fujimori, Yoshihiko, Iwaki, Tomohiro, Okada, Tomonori

Publikováno v: Proceedings of SPIE; April 2023, Vol. 12496 Issue: 1 p1249611-1249611-12

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Conference

Two-dimensional dose and focus-error measurement technology for exposure tool management in half-pitch 3x generation.

Autor: Fukazawa, Kazuhiko, Kudo, Yuji, Fujimori, Yoshihiko, Yoshino, Kiminori, Yamazaki, Yuichiro

Publikováno v: Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72721I-72721I-10, 10p

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Conference

Novel technology of automatic macro inspection for 32-nm node and best focus detection.

Autor: Fukazawa, Kazuhiko, Endo, Kazumasa, Yoshino, Kiminori, Yamazaki, Yuichiro

Publikováno v: Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65182H-65182H-7, 7p

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Conference

Novel inspection technology for half pitch 55 nm and below.

Autor: Omori, Takeo, Fukazawa, Kazuhiko, Mikami, Toru, Yoshino, Kiminori, Yamazaki, Yuichiro

Publikováno v: Proceedings of SPIE; Nov2005, Issue 1, p174-182, 9p

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