Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Fuchino Fumihiro"'
Autor:
Naoe, Takuya, Endoh, Hirohiko, Fuchino, Fumihiro, Miyata, Masanori, Miyake, Hidetsugu, Takahashi, Takuya, Fujimoto, Takaaki
Publikováno v:
In Materials Science in Semiconductor Processing 15 August 2018 83:239-248
Autor:
Hirohiko Endoh, Takuya Naoe, Masanori Miyata, Takaaki Fujimoto, Hidetsugu Miyake, Fuchino Fumihiro, Takahashi Takuya
Publikováno v:
Materials Science in Semiconductor Processing. 83:239-248
In this study, the mechanism of void formation in the Al metal lines of TiN/Al-1%Si-0.5%Cu/TiN anti-refraction coating multi-layer structures has been investigated. The produced voids exhibited distinct characteristics (such as the presence of silico
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dceda279fb6cadc56d40107214bc3d94
https://doi.org/10.1016/j.mssp.2018.04.013
https://doi.org/10.1016/j.mssp.2018.04.013