Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Fu, Zubiao"'
Publikováno v:
2017 China Semiconductor Technology International Conference (CSTIC).
An effective image based method to automatically measure the profile parameters (PPs), including the critical dimensions (CDs), the full height and other structural parameters, of the integrated circuit (IC) devices in batch is proposed. In this meth
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::918765f19a4ce24854d3ba2a01b7375d
https://doi.org/10.1109/cstic.2017.7919843
https://doi.org/10.1109/cstic.2017.7919843
Autor:
Lanyan Shi, Yiping Xu, Cong Zhang, Yaoming Shi, Yi Huang, Shijian Zhang, Yi-Shih Lin, Fu Zubiao
Publikováno v:
2015 China Semiconductor Technology International Conference.
Mask Fidelity plays a vital role in the lithography process of cutting-edge IC fabrication. The Fidelity of Mask is fundamental to the final performance of the lithography process in production. A contour is extracted from the CD-SEM image of the cor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02f5a3a711a3e36ef45d2eb8582b175d
https://doi.org/10.1109/cstic.2015.7153359
https://doi.org/10.1109/cstic.2015.7153359
Autor:
Fu, Zubiao, Zhang, Shijian, Huang, Yi, Lin, Yi-Shih, Shi, Lanyan, Zhang, Cong, Shi, Yaoming, Xu, Yiping
Publikováno v:
2015 China Semiconductor Technology International Conference; 2015, p1-3, 3p