Introduction of Pre-etch Deposition Techniques in EUV Patterning.

Autor: Xun Xiang, Beique, Genevieve, Lei Sun, Labonte, Andre, Labelle, Catherine, Nagabhirava, Bhaskar, Friddle, Phil, Schmitz, Stefan, Goss, Michael, Metzler, Dominik, Arnold, John

Publikováno v: Proceedings of SPIE; 1/17/2018, Vol. 10589, p105890K-1-105890K-12, 12p, 9 Black and White Photographs, 3 Diagrams, 3 Charts

Plasma etch challenges with new EUV lithography material introduction for patterning for MOL and BEOL

Autor: Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Lee, Changwoo, Nagabhirava, Bhaskar, Goss, Michael, Wang, Peng, Friddle, Phil, Schmitz, Stafan, Wu, Jian, Yang, Richard, Mignot, Yann, Rassoul, Nouradine, Hamieh, Bassem, Beique, Genevieve, Labonte, Andre, Labelle, Catherine, Arnold, John, Mucci, John

Publikováno v: Proceedings of SPIE; March 2015, Vol. 9428 Issue: 1 p94280A-94280A-8, 848529p