Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Frederik Blumrich"'
Publikováno v:
2017 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC).
Mo/Si multilayer (ML) coatings are widely used as reflective coatings of XUV optics, particularly — mirrors and photomasks in EUV (13.5 nm) lithography. Therefore, the problem of controllable change of optical properties of such coatings, first of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3d95a9cd6131f3390020215f3685597
https://doi.org/10.1109/cleoe-eqec.2017.8087280
https://doi.org/10.1109/cleoe-eqec.2017.8087280
Publikováno v:
Journal of Air Transport Management. 17:33-39
In recent years, aircraft manufacturers have concentrated on developing new long-haul widebody aircraft, such as Airbus’s A380 and A350XWB and Boeing’s 787 and 747-8. The next challenge for manufacturers and suppliers is the development of new sh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2a714cf9da07fb62bd63c70afb0d4016
https://doi.org/10.1016/j.jairtraman.2010.10.007
https://doi.org/10.1016/j.jairtraman.2010.10.007
Autor:
Michael Goldstein, Markus Waiblinger, Renzo Capelli, Thomas Scheruebl, Anthony Garetto, Frederik Blumrich, Jan Hendrik Peters, Krister Magnusson
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 13:043006
The introduction of extreme ultraviolet (EUV) lithography into manufacturing requires changes in all aspects of the infrastructure, including the photomask. EUV reflective masks consist of a sophisticated multilayer (ML) mirror, capping layer, absorb
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34dad932080b4294c770ae49386231af
https://doi.org/10.1117/1.jmm.13.4.043006
https://doi.org/10.1117/1.jmm.13.4.043006
Bias errors in subpixel displacement estimation for optical correlation-based measurement techniques
Autor:
Frederik Blumrich
Publikováno v:
Optical Engineering. 49:067004
The systematic error introduced when using 1-D peak detection algorithms to decompose elliptically shaped correlation peaks is investigated. First, an analytical description of this error is derived, and it is shown that this error can lead to a syst
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::64e7d2082907e803d805e33bafc65c3e
https://doi.org/10.1117/1.3456595
https://doi.org/10.1117/1.3456595