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pro vyhledávání: '"Frauke Ruggeberg"'
Autor:
Mario Schiffler, Steffen Kirchner, Hans Willy Becker, Bernhard Jagle, Lutz Aschke, Markus Renno, Guenter Hess, Ute Buttgereit, Konrad Knapp, Larissa Juschkin, Nathalie Olschewski, Frauke Ruggeberg, Thomas Leutbecher, Christian Wies, Frank Sobel, Kurt Walter, Rainer Lebert
Publikováno v:
Scopus-Elsevier
Schott Lithotec has introduced all relevant technology steps to manufacture EUV mask blanks in its advanced quality mask blank manufacturing line -- ranging from Low Thermal Expansion Material (LTEM) high quality substrate polishing to low defect bla