Zobrazeno 1 - 10
of 128
pro vyhledávání: '"Franz Schäfers"'
Autor:
Andrey Sokolov, Franz Schäfers
Publikováno v:
Journal of large-scale research facilities JLSRF, Vol 2, p A92 (2016)
A versatile UHV-polarimeter for the EUV XUV spectral range is described which incorporates two optical elements: a phase retarder and a reflection analyzer. Both optics are azimuthally rotatable around the incident synchrotron radiation beam and the
Externí odkaz:
https://doaj.org/article/0bea0d813a40429788c20a57308c3aa7
Autor:
Franz Schäfers
Publikováno v:
Journal of large-scale research facilities JLSRF, Vol 2, p A96 (2016)
The KMC-1 is a soft x-ray double crystal monochromator beamline for the energy range between 2 and 12 keV. The bending magnet beamline as well as the experiment are under UHV-condition. It incorporates high indexed Si-crystals for high resolution and
Externí odkaz:
https://doaj.org/article/3d785b5490f04e7a97df4f5d9cd9abf5
Autor:
Franz Schäfers, Andrey Sokolov
Publikováno v:
Journal of large-scale research facilities JLSRF, Vol 2, p A50 (2016)
The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consis
Externí odkaz:
https://doaj.org/article/0d3fbc8046874b05b750fa1c37e97e61
Autor:
Yu. A. Vainer, Nikolay I. Chkhalo, Vladimir N. Polkovnikov, M. V. Svechnikov, R. M. Smertin, S. A. Garakhin, M.G. Sertsu, Franz Schäfers, N. N. Salashchenko, R. S. Pleshkov, A. N. Nechay, S. Yu. Zuev, Andrey Sokolov
Publikováno v:
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques. 14:124-134
The latest experimental results of studying beryllium-containing multilayer mirrors are reviewed. The mirrors are of interest for projection nanolithography, solar astronomy, X-ray microscopy, and other applications. It is shown that for a number of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dc6aa108ca0ac660ec3024d693f80925
https://doi.org/10.1134/s1027451020020160
https://doi.org/10.1134/s1027451020020160
Autor:
R. S. Pleshkov, Franz Schäfers, M. V. Svechnikov, M.G. Sertsu, Andrey Sokolov, Nikolay I. Chkhalo, Vladimir N. Polkovnikov, S. Yu. Zuev, N. N. Salashchenko
Publikováno v:
Technical Physics. 64:1688-1691
The performance of multilayer Mo/Si mirrors with B4C and Be spacers near a wavelength of 13.5 nm has been studied. It has been shown that four-component Mo/Be/Si/B4C mirrors outperform Mo/Si and Mo/Si/B4C mirrors in reflection coefficient by 2.0 and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::500c8df3582d7ec8aabeb7253bf421c7
https://doi.org/10.1134/s1063784219110318
https://doi.org/10.1134/s1063784219110318
Autor:
M. V. Svechnikov, R. M. Smertin, Franz Schäfers, S. A. Garakhin, S. Yu. Zuev, M.G. Sertsu, A. N. Nechai, Pavel A. Yunin, Nikolay I. Chkhalo, Vladimir N. Polkovnikov, Andrey Sokolov, N. N. Salashchenko
Publikováno v:
Technical Physics. 64:1692-1697
The influence of thermal action on X-ray optics performance and structure of films and transition regions in multilayer Mo/Be mirrors optimized for a reflection maximum in the interval 11.2–11.4 nm at normal incidence has been considered. The annea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1632fab9b593263c1f1c4286a4a04e6e
https://doi.org/10.1134/s1063784219110252
https://doi.org/10.1134/s1063784219110252
Autor:
Xiangdong Xu, Kay Dietrich, Dakui Lin, Franz Schäfers, Keqiang Qiu, Tonglin Huo, Huoyao Chen, Ernst-Bernhard Kley, Yilin Hong, Ying Liu, Zhengkun Liu, Stefanie Kroker, Hongjun Zhou, M.G. Sertsu, Andrey Sokolov
Publikováno v:
Journal of Synchrotron Radiation
A method comprising near-field holography with an electron beam lithography-written phase mask was developed herein. Soft X-ray varied-line-spacing gratings with a central groove density greater than 3000 lines mm−1 were fabricated using this metho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8f8bd79e9f6c86d9155b49caa6cbddc0
http://europepmc.org/articles/PMC6730620
http://europepmc.org/articles/PMC6730620
Autor:
M. V. Svechnikov, M.G. Sertsu, Nikolay I. Chkhalo, N. N. Salashchenko, Vladimir N. Polkovnikov, Andrey Sokolov, Franz Schäfers
Publikováno v:
Optical Engineering. 60
Mo/Be multilayers are promising optical elements for extreme ultraviolet (EUV) lithography and space optics. Experimentally derived optical constants are necessary for accurate and reliable design of beryllium-containing optical coatings. We report o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::29dd7e928d5f7c2ab047dc4a6c081895
https://doi.org/10.1117/1.oe.60.4.044103
https://doi.org/10.1117/1.oe.60.4.044103
Autor:
Andrey Sokolov, R. S. Pleshkov, Nikolay I. Chkhalo, M.G. Sertsu, Vladimir N. Polkovnikov, N. N. Tsybin, N. N. Salashchenko, Franz Schäfers, M. V. Svechnikov, Alexey Lopatin
In this work, the refractive index of beryllium in the photon energy range 20.4–250 eV was experimentally determined. The initial data include measurements of the transmittance of two free-standing Be films with thicknesses of 70 nm and 152 nm, as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f29c568a8f836e2e1b69444d0abadf7f
http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=100879
http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=100879
Autor:
N. N. Salashchenko, S. A. Gusev, Andrey Sokolov, D. A. Tatarskiy, M.G. Sertsu, Nikolay I. Chkhalo, M. V. Zorina, A. E. Pestov, A. N. Nechay, Vladimir N. Polkovnikov, Yu. A. Vainer, D. E. Pariev, Franz Schäfers, M. V. Svechnikov
Publikováno v:
Optics express. 26(26)
A comparative study was carried out of the structure and reflection performance of four types of multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be structure and three Mo/Be-based structures with thin B4C, C and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::486d66a09db601d65b4251cb42701959
https://pubmed.ncbi.nlm.nih.gov/30650805
https://pubmed.ncbi.nlm.nih.gov/30650805