Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Frank Vofl"'
Autor:
Peter Oesterlin, Frank Vofl, Rustem Osmanov, Michael Fiebig, L. Uzuka, Uwe Stamm, Naoyuki Kobayashi, Burkhard Fechner
Publikováno v:
SPIE Proceedings.
TFT flat panel displays are rapidly increasing their share in the display market. Polycrystalline-silicon TFT technology is opening the door to highly reliable, high-resolution, high performance and large size Active Matrix Liquid Crystal Displays (A
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ea560cce981082189fa83ca227fb633
https://doi.org/10.1117/12.377054
https://doi.org/10.1117/12.377054
Autor:
Sergei V. Govorkov, Juergen Kleinschmidt, Rainer Paetzel, Frank Vofl, Uwe Stamm, Klaus Vogler, Evgueni V. Slobodtchikov, Dirk Basting, Igor Bragin
Publikováno v:
SPIE Proceedings.
Optical deep UV (DUV) lithography is aiming to reach feature sizes of below 100 nm. The likely choice of the exposure wavelength will be 157 nm, which is emitted by the F2 excimer laser. Experience with this laser type in a variety of applications ha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba3e4b5e65b1d66a5f6aaebbe7d62c42
https://doi.org/10.1117/12.351152
https://doi.org/10.1117/12.351152