Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Frank R. Myers"'
Publikováno v:
Thin Solid Films. 253:522-528
We used Monte Carlo simulations (MCS) to study the transport of ions through single and dual frequency, multicomponent plasma sheaths during plasma enhanced deposition of silicon dioxide from TEOS and oxygen mixtures (PETEOS). First, we used our dual
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::89f2d8f826b1a5b2669c9c138d52de3b
https://doi.org/10.1016/0040-6090(94)90378-6
https://doi.org/10.1016/0040-6090(94)90378-6
Publikováno v:
Journal of The Electrochemical Society. 141:1313-1320
We present a model to predict the energy and angular distributions of ions which impact the substrate in low (100-450 kHz), high (13.56 MHz), and dual (13.56 MHz+100-450 kHz) frequency plasmas. The model combines a single and dual frequency plasma sh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd3d1d29ba674f337a58380190eb0aa4
https://doi.org/10.1149/1.2054916
https://doi.org/10.1149/1.2054916
Autor:
Frank R. Myers, Timothy S. Cale
Publikováno v:
Journal of The Electrochemical Society. 139:3587-3595
A model which predicts the voltage distributions in the sheaths of a dual‐frequency parallel‐plate plasma reactor is presented. Both time‐dependent and time‐averaged Poisson's equations are solved to predict the sheath thicknesses and potenti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16f8e031d140debd72fbcfd4d2a3f554
https://doi.org/10.1149/1.2069127
https://doi.org/10.1149/1.2069127
Publikováno v:
SPIE Proceedings.
MOSFET instabilities as a result of plasma processing have received significant attention in recent years. The focus of previous research has been directed at basic MOSFET devices. This paper describes the effects of PECVD PSG passivation on EEPROM d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::36607deca2349616871332611cde431a
https://doi.org/10.1117/12.139358
https://doi.org/10.1117/12.139358
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 13:1875
We use EVOLVE−FLOW, a thin film thermal flow process simulator, to simulate the thermal flow of borophosphosilicate glass (BPSG) and phosphosilicate glass (PSG) thin films in trenches on patterned wafers, where two‐dimensional surface evolution i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::640cc83c24d50c069ee79d8a88efee69
https://doi.org/10.1116/1.587827
https://doi.org/10.1116/1.587827
Publikováno v:
Carbon. 25:85-95
The technique based upon the constant pattern model was extended to evaluate mass transfer coefficients for multicomponent (binary) adsorption by carbons. The mass transfer coefficient of the lesser adsorbed component was essentially the same for bot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::958c68add16c12f3cf2c3831745d547f
https://doi.org/10.1016/0008-6223(87)90044-3
https://doi.org/10.1016/0008-6223(87)90044-3
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