Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Frank Hillmann"'
Autor:
Jan A. Freund, Raphael Andreas Daniel Wansing, Rosanna Isabel Schöneich-Argent, Holger Freund, Julian Merder, Daniel Cordes, Frank Hillmann
Publikováno v:
Marine pollution bulletin. 146
Being globally and locally prevalent, beach litter has been monitored at 29 sites along the German North Sea coastline. This study offers an exploratory analysis of data from 1991 to 2016. Schleswig-Holstein exhibited lower mean litter pollution leve
Publikováno v:
SPIE Proceedings.
New results using the world's first optical DUV mask CD (critical dimension) metrology system based on water immersion (WI) technology (Vistec LWM500 WI) are presented. In order to improve repeatability and linearity, especially for feature sizes sma
Publikováno v:
23rd European Mask and Lithography Conference.
Besides the mask market for IC manufacturing, which mainly uses 6 inch sized masks, the market for the so called large area masks is growing very rapidly. Typical applications of these masks are mainly wafer bumping for current packaging processes, c
Autor:
Klaus-Dieter Roth, Walter Steinberg, Jochen Bender, Gerhard Schluter, Michael Ferber, Frank Hillmann, Gerd Scheuring
Publikováno v:
SPIE Proceedings.
For 65nm photo mask lithography, metrology becomes significantly more important. Especially the requirements of the photo mask users versus critical dimension (CD) control, CD homogeneity and CD mean to target, give strong head-aches to lithography a
Autor:
Gerd Scheuring, Günther Falk, Richard Reiter, Michael Heiden, Wolfgang Vollrath, Stefan Dobereiner, Wolfgang Sulik, Gerhard Hoppen, Artur Bosser, Christian Gittinger, Hans-Jürgen Brück, Frank Hillmann
Publikováno v:
SPIE Proceedings.
The increased requirements on reticles for the 65nm technology node with respect to CD homogeneity and CD mean to target requirements call for a metrology system with adequate measurement performance. We report on the new water immersion technique an
Autor:
Shiuh-Bin Chen, Stefan Dobereiner, Parkson W. Chen, Gerd Scheuring, Karl Sommer, Rik Jonckheere, Kai Peter, Frank Hillmann, Christian Gittinger, Hans-Jürgen Brück, Hans Hartmann, Thomas Schatz, Andrew C. Hourd, Vicky Philipsen, Anthony Grimshaw, Volodymyr Ordynskyy
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
The MueTec advanced CD metrology and review station, operating at the DUV (248nm) wavelength, has been extensively characterised for a number of feature types relevant to advanced (9Onm technology node) reticles. Performance for resolution capability
Autor:
Stefan Doebereiner, Anthony Grimshaw, Thomas Schatz, Andrew C. Hourd, Gordon Hughes, Parkson W. Chen, Hans-Jürgen Brück, Paul J. M. van Adrichem, Shiuh-Bin Chen, Herman Boerland, Alexander Petrashenko, Gerd Scheuring, Thomas Struck, Sigrid Lehnigk, Frank Hillmann
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
Besides the metrology performance of a CD measurement tool, its close integration into a manufacturing environment becomes more and more important. This is extremely driven by the ever increasing complexity of masks and their tightening specification
Autor:
Thomas Schaetz, Shiuh-Bin Chen, Kai Peter, Parkson W. Chen, Frank Hillmann, Karl Sommer, Hans-Jurgen Brueck, Rik Jonckheere, Andrew C. Hourd, Vicky Philipsen, Gerd Scheuring, Volodymyr Ordynskyy
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
A comparison has been made in terms of mask CD linearity measurements between the 2 tool versions of a 248nm based optical CD metrology tool for photomasks, i.e., the high-NA M5k-SWD and the through-pellicle M5k-LWD, as well as to a reticle SEM, i.e.
Autor:
Parkson W. Chen, Hans-Juergen Brueck, Christian Gittinger, Stefan Doebereiner, Gerd Scheuring, Anthony Grimshaw, Thomas Schaetz, Vicky Philipsen, Kai Peter, Shiuh-Bin Chen, Andrew C. Hourd, Hans Hartmann, Frank Hillmann, Volodymyr Ordynskyy, Karl Sommer, Rik Jonckheere
Publikováno v:
SPIE Proceedings.
The new MueTec , an advanced CD metrology and review station operating at DUV (248nm) wavelength, has been extensively characterised in a reticle production environment. Performance data including resolution, measurement repeatability and throughput