Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Frank Flohrer"'
Autor:
Vladimir Dr. Korobochko, Bjoern Mader, Kai Gaebel, Juergen Kleinschmidt, Henry Birner, Guido Hergenhan, Jesko Dr. Brudermann, Sven Goetze, Denis Bolshukhin, Uwe Stamm, Imtiaz Ahmad, Diethard Kloepfel, Guido Schriever, Frank Flohrer, Rainer Mueller, Tran Duc Chinh, Christian Ziener, Jens Ringling
Publikováno v:
High-Power Laser Ablation V.
The availability of extreme ultraviolet (EUV) light sources, measurement tools and integrated test systems is of major importance for the development of EUV lithography for use in high volume chip manufacturing which is expected to start in 2009. The
Autor:
Juergen Kleinschmidt, Tran Duc Chinh, Guido Hergenhan, Guido Schriever, Vladimir Korobotchko, Sven Goetze, Henry Birner, Imtiaz Ahmad, Rainer Mueller, Jens Ringling, Christian Ziener, Frank Flohrer, Uwe Stamm, Diethard Kloepfel, Björn Mader, Kai Gaebel, Denis Bolshukhin, Jesko Dr. Brudermann
Publikováno v:
SPIE Proceedings.
Semiconductor chip manufacturers are expecting to use extreme ultraviolet (EUV) lithography for high volume manufacturing of DRAMs and ICs starting by the end of this decade. Among all the technologies and modules which have to be developed EUV sourc
Autor:
Christian H. Ziener, Jesko Dr. Brudermann, Vladimir Korobotchko, Frank Flohrer, Jürgen Dr. Kleinschmidt, Sven Götze, Kai Dr. Gäbel, Uwe Stamm, Guido Hergenhan, Guido Schriever, D. Bolshukhin, Imtiaz Ahmad, Diethard Klöpfel, Istvan Balogh, Henry Birner, S. Enke, Chinh Duc Prof. Tran, Jens Ringling
Publikováno v:
SPIE Proceedings.
Semiconductor chip manufacturers are expecting to use extreme UV lithography for production in 2009. EUV tools require high power, brilliant light sources at 13.5 nm with collector optics producing 120 W average power at entrance of the illuminator s
Autor:
O B Khristoforov, Alexander S. Ivanov, Guido Schriever, Vladimir M. Borisov, Juergen Kleinschmidt, Jens Ringling, Vladimir Korobotchko, Frank Flohrer, Uwe Stamm, Sven Goetze, Aleksandr Yu. Vinokhodov, Peter Koehler, Kai Gaebel, Imtiaz Ahmad, Diethard Kloepfel
Publikováno v:
Emerging Lithographic Technologies VI.
Next generation semiconductor chip manufacturing using extreme ultraviolet (EUV) lithography requires a brilliant radiation source with output power between 50 W and 120 W in intermediate focus. This is about five to ten times higher power than that
Autor:
Imtiaz Ahmad, Vladimir Korobotchko, Peter Koehler, Guido Schriever, Kai Gaebel, Uwe Stamm, Frank Flohrer, Diethard Kloepfel, Sven Goetze, Jens Ringling, Juergen Kleinschmidt
Publikováno v:
Gas and Chemical Lasers and Intense Beam Applications III.
In this paper we discuss new results from investigations on high power EUV sources for micro-lithography based on gas discharge produced plasmas and laser produced plasmas. The EUV development is performed at XTREME technologies GmbH, a joint venture
Publikováno v:
EUV Sources for Lithography; 1/ 1/2006, Vol. PM149, p413-452, 40p
Autor:
Stamm, Uwe
Publikováno v:
Journal of Physics D: Applied Physics; 12/ 7/2004, Vol. 37 Issue 23, p3244-3253, 10p
Autor:
Stamm, U., Ahmad, I., Flohrer, F., Gabel, K., Gotze, S., Kleinschmidt, J., Klopfel, D., Kohler, P., Korobotchko, V., Ringling, J., Schriever, G.
Publikováno v:
Summaries of Papers Presented at the Lasers & Electro-Optics. CLEO '02. Technical Diges; 2002, p440-440, 1p
Publikováno v:
Summaries of Papers Presented at the Lasers & Electro-Optics. CLEO '02. Technical Diges; 2002, p439-439, 1p
Autor:
Susanne Gieler-Breßmer
Inmitten zunehmender Urbanisierung und einer weiterhin steigenden Anzahl zugelassener Fahrzeuge wird die Bedeutung von Parkbauten weiter zunehmen. Gleichzeitig streben immer mehr Städte an, autofrei zu werden. Parkbauten können dabei einen bedeuten