Zobrazeno 1 - 2
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pro vyhledávání: '"Frank Erber"'
Publikováno v:
SPIE Proceedings.
At photomask manufacturing, post pellicle inspection suffers from an interference of pellicle size and height dimensions with the inspection equipment requirements. This pellicle shadow causes nonreliable inspection results. The evolution of this eff
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c762620792ecefa6d936c1f57fcd5382
https://doi.org/10.1117/12.746681
https://doi.org/10.1117/12.746681
Publikováno v:
SPIE Proceedings.
CD uniformity and CD mean to target specifications nowadays can only be accomplished by mask manufacturing process using chrome dry etch. Chrome plasma etch processes tend to show a strong dependency of the chrome etch rate and thus the etch bias on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2434b3684783c71a0cec3422156bc61e
https://doi.org/10.1117/12.438358
https://doi.org/10.1117/12.438358