Zobrazeno 1 - 10
of 42
pro vyhledávání: '"Frank E. Abboud"'
Autor:
Bassam Shamoun, Zachary Alberti, Igal Bucay, S. Ellis, Michael Erickson, B. Liu, Mahesh Chandramouli, Andrew T. Sowers, Frank E. Abboud, G. Hochleitner, M. Tomandl, C. Klein, E. Platzgummer
Publikováno v:
Novel Patterning Technologies 2023.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1dda979ac545253e975cc2ee96dedd9
https://doi.org/10.1117/12.2657746
https://doi.org/10.1117/12.2657746
Autor:
Mahesh Chandramouli, Bin Liu, Zachary Alberti, Frank E. Abboud, Gottfried Hochleitner, Witold Wroczewski, Stefan Kuhn, Christof Klein, Elmar Platzgummer
Publikováno v:
Photomask Technology 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5cbdbbb04785aed5778db289c18976d
https://doi.org/10.1117/12.2645895
https://doi.org/10.1117/12.2645895
Autor:
Yusuke Teramoto, Frank E. Abboud, Firoz Ghadiali, Hidenori Watanabe, Takahiro Shirai, Ted Liang, Safak Sayan, Kazuya Aoki, Marieke Jager, Steven L. Carson, Yoshihiro Tezuka, Kishore K. Chakravorty, Shunichi Morimoto, Yoshihiko Sato
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII.
Improved lithography resolution provided by EUVL simplifies the patterning process and makes it possible to use less restrictive design rules. This in turn enables cost effective scaling with extendibility. There are several technical challenges and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb9186613752fc7422dddbec71d2e2e2
https://doi.org/10.1117/12.2588788
https://doi.org/10.1117/12.2588788
Autor:
Frank E. Abboud, Igal Bucay, Reid K. Juday, Bin Liu, Andrew T. Sowers, Mahesh Chandramouli, Bassam Shamoun
Publikováno v:
Novel Patterning Technologies 2021.
EUV lithography requirements continue to present new challenges and opportunities for multi-beam mask writer. Driven by sub-10nm node mask requirements for higher resolution, CD uniformity, pattern placement accuracy, lower line edge roughness (LER),
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab764105e036beed1f76e9a3f27df219
https://doi.org/10.1117/12.2586863
https://doi.org/10.1117/12.2586863
Autor:
Eric Frendberg, Firoz Ghadiali, Frank E. Abboud, Guojing Zhang, Kishore K. Chakravorty, Marieke Jager, Yoshihiro Tezuka, Safak Sayan, Ted Liang, Srinath Satyanarayana
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI.
With the persistent drive to enable EUV lithography (EUVL) for the continuation of pattern scaling and the close collaborations between suppliers and customers, tremendous progress has been made in the last five years in EUV mask infrastructure devel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0158365acc6ce3dc97b30891aadb6c3
https://doi.org/10.1117/12.2554496
https://doi.org/10.1117/12.2554496
Autor:
Yulia Korobko, Yoshihiro Tezuka, Mahesh Chandramouli, Frank E. Abboud, Andrew T. Sowers, Reid K. Juday, Bassam Shamoun, Bin Liu
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020.
Multi-beam mask writers (MBMW) manufactured by IMS Nanofabrication have been increasingly been accepted into mainstream mask making. Over the past decade, this new class of tools has successfully transitioned from the concept, to development and fina
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::483ed926705f1ad554c9d33dfcd38579
https://doi.org/10.1117/12.2556552
https://doi.org/10.1117/12.2556552
Publikováno v:
SPIE Proceedings.
Mask writers’ architectures have evolved through the years in response to ever tightening requirements for better resolution, tighter feature placement, improved CD control, and tolerable write time. The unprecedented extension of optical lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78f932c543009c24fe808a5501cedfb2
https://doi.org/10.1117/12.2072135
https://doi.org/10.1117/12.2072135
Autor:
Thomas B. Faure, Frank E. Abboud
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2cc9073ef9278915c76daa7e4441ffce
https://doi.org/10.1117/12.2008671
https://doi.org/10.1117/12.2008671
Publikováno v:
SPIE Proceedings.
Mask patterning capability continues to be a key enabler for wafer patterning. Mask writer performance is critical to meet reticle resolution, critical dimension uniformity, registration, and throughput requirements. Technology trends indicate that m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dee6d5af0ef6159dbe6a5a0febc4c260
https://doi.org/10.1117/12.977172
https://doi.org/10.1117/12.977172
Autor:
Wilhelm Maurer, Frank E. Abboud
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e2730687c3ccee8c0b0344d6e7d23cb
https://doi.org/10.1117/12.917331
https://doi.org/10.1117/12.917331