Zobrazeno 1 - 1
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pro vyhledávání: '"Francois Furthner"'
Autor:
Frank Staals, Benny Gosali, Francois Furthner, Chih-Ming Ke, Desmond Ngo, Jia-Rui Hu, Maryana Escalante Marun, Ward Tu, Robin Tijssen, Christian Marinus Leewis, Martijn van Veen, Ying-Yu Chen, Stuart Young, Vincent Huang, K. H. Chen, Frankie Tsai, Kaustuve Bhattacharyya, Brian Lee, C. H. Liao, Carlo Cornelis Maria Luijten, Marc Noot
Publikováno v:
SPIE Proceedings.
In advanced optical lithography the requirements of focus control continues to tighten. Usable depth of focus (DoF) is already quite low due to typical sources of focus errors, such as topography, wafer warpage and the thickness of photoresist. And n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a7ba0c5fc3124d3fa3b7e4e4df6204a
https://doi.org/10.1117/12.2220373
https://doi.org/10.1117/12.2220373
