Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

Autor: Ruben Schupp, Randy Meijer, Oscar Versolato, Ronnie Hoekstra, Stefan Witte, John Sheil, Amanda Neukirch, M. M. Basko, Francesco Torretti, James Colgan, Muharrem Bayraktar, Wim Ubachs

Publikováno v: Nature Communications, Vol 11, Iss 1, Pp 1-8 (2020)
Nature Communications, 11(1):2334, 1-8. Nature Publishing Group
Torretti, F, Sheil, J, Schupp, R, Basko, M M, Bayraktar, M, Meijer, R A, Witte, S, Ubachs, W, Hoekstra, R, Versolato, O O, Neukirch, A J & Colgan, J 2020, ' Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography ', Nature Communications, vol. 11, no. 1, 2334, pp. 1-8 . https://doi.org/10.1038/s41467-020-15678-y
Nature Communications
Nature Communications, 11(1):2334. Nature Publishing Group
Nature communications, 11(1):2334. Nature Publishing Group

Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the continued miniaturization of semiconductor devices. The required EUV light, at 13.5 nm wavelength, is produced in a hot and dense laser-driven tin pla

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b3106e422103e540355332bd786f35d9
https://doaj.org/article/6a95599c1e5e4450b7df90e19506645e

Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography

Autor: Zoi Bouza, Francesco Torretti, Alex Bayerle, M. J. Deuzeman, J. R. Crespo López-Urrutia, John Sheil, Ronnie Hoekstra, S. Rai, Randy Meijer, James Colgan, Muharrem Bayraktar, R. Schupp, Wim Ubachs, Amanda Neukirch, Dmitry Kurilovich, Stefan Witte, Bo Liu, A N Ryabtsev, Lucas Poirier, Oscar Versolato, Joris Scheers, Lars Behnke, H. Bekker

Publikováno v: Journal of Physics : Conference Series, 1412(19):192006, 1-1. IOP Publishing Ltd.
Versolato, O, Bayerle, A, Bayraktar, M, Behnke, L, Bekker, H, Bouza, Z, Colgan, J, Crespo López-Urrutia, J R, Deuzeman, M J, Hoekstra, R, Kurilovich, D, Liu, B, Meijer, R, Neukirch, A, Poirier, L, Rai, S, Ryabtsev, A, Scheers, J, Schupp, R, Sheil, J, Torretti, F, Ubachs, W & Witte, S 2020, ' Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography ', Journal of Physics : Conference Series, vol. 1412, no. 19, 192006, pp. 1-1 . https://doi.org/10.1088/1742-6596/1412/19/192006
Journal of Physics: Conference Series: Plasmas & Particle acceleration, 1412(19)
ISSUE=31;TITLE=XXXIst International Conference on Photonic, Electronic, and Atomic Collisions 2019

Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stabi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5e956001d45df07270d8fa3564c9b180
https://research.vu.nl/en/publications/8f9f2979-35c0-4135-bd86-9053be94e3e3

Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma

Autor: Oscar Versolato, Stefan Witte, Kjeld S. E. Eikema, Francesco Torretti, Ruben Schupp, John Sheil, Muharrem Bayraktar, Joris Scheers, Dmitry Kurilovich, Ronnie Hoekstra, Wim Ubachs, Alexander Schafgans, Randy Meijer, Alex Bayerle, Michael Purvis

Publikováno v: Applied Physics Letters, 115(12):124101, 1-5. American Institute of Physics Publising LLC
Applied Physics Letters, 115(12):124101. AMER INST PHYSICS
Applied Physics Letters
Schupp, R, Torretti, F, Meijer, R A, Bayraktar, M, Sheil, J, Scheers, J, Kurilovich, D, Bayerle, A, Schafgans, A A, Purvis, M, Eikema, K S E, Witte, S, Ubachs, W, Hoekstra, R & Versolato, O O 2019, ' Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma ', Applied Physics Letters, vol. 115, no. 12, 124101, pp. 1-5 . https://doi.org/10.1063/1.5117504
Applied physics letters, 115(12):124101. American Institute of Physics

Experimental scaling relations of the optical depth are presented for the emission spectra of a tin-droplet-based, 1-μm-laser-produced plasma source of extreme-ultraviolet (EUV) light. The observed changes in the complex spectral emission of the pla

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2afb8386ed3fabfbb32d8e9693b8d3e6
https://doi.org/10.1063/1.5117504

Expansion Dynamics after Laser-Induced Cavitation in Liquid Tin Microdroplets

Autor: Hanneke Gelderblom, Aneta Stodolna, Kjeld S. E. Eikema, Francesco Torretti, Tiago de Faria Pinto, Stefan Witte, Wim Ubachs, Joris Scheers, Ronnie Hoekstra, Oscar Versolato, Ruben Schupp, Dmitry Kurilovich

Publikováno v: Kurilovich, D, Pinto, T D F, Torretti, F, Schupp, R, Scheers, J, Stodolna, A S, Gelderblom, H, Eikema, K S E, Witte, S, Ubachs, W, Hoekstra, R & Versolato, O O 2018, ' Expansion Dynamics after Laser-Induced Cavitation in Liquid Tin Microdroplets ', Physical Review Applied, vol. 10, no. 5, 054005, pp. 1-8 . https://doi.org/10.1103/PhysRevApplied.10.054005
Physical Review Applied, 10(5):054005. American Physical Society
Physical Review Applied, 10(5):054005. AMER PHYSICAL SOC
Physical Review Applied, 10(5):054005, 1-8. American Physical Society

The cavitation-driven expansion dynamics of liquid tin microdroplets is investigated, set in motion by the ablative impact of a 15-ps laser pulse. We combine high-resolution stroboscopic shadowgraphy with an intuitive fluid dynamic model that include

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d44d154cdfda894738ae98ecbc814da9
https://hdl.handle.net/1871.1/746d4d6f-3474-441a-a0cc-d295a3e1e423

Energy Level Structure of Sn$^{3+}$ Ions

Autor: Anastasia Borschevsky, Ronnie Hoekstra, Wim Ubachs, Ruben Schupp, Dmitry Kurilovich, K. Haris, A. N. Ryabtsev, Joris Scheers, Oscar Versolato, Alex Bayerle, Julian C. Berengut, Ephraim Eliav, Francesco Torretti

Publikováno v: Scheers, J, Ryabtsev, A, Borschevsky, A, Berengut, J C, Haris, K, Schupp, R, Kurilovich, D, Torretti, F, Bayerle, A, Eliav, E, Ubachs, W, Versolato, O O & Hoekstra, R 2018, ' Energy-level structure of Sn3+ ions ', Physical Review A, vol. 98, no. 6, 062503, pp. 1-12 . https://doi.org/10.1103/PhysRevA.98.062503
Physical Review A, 98(6):062503. AMER PHYSICAL SOC
Physical Review A, 98(6):062503, 1-12. American Physical Society

Laser-produced Sn plasma sources are used to generate extreme ultraviolet (EUV) light in state-of-the-art nanolithography. An ultraviolet and optical spectrum is measured from a droplet-based laser-produced Sn plasma, with a spectrograph covering the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9a487e5c86a011d1d1e0f8d8a671f8fa
http://arxiv.org/abs/1807.01644