Výsledky vyhledávání - "Fontaine, Bruno La"

Akademický článek

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Autor: Naulleau, Patrick P., Anderson, Christopher N., Chiu, Jerrin, Denham, Paul, George, Simi, Goldberg, Kenneth A., Goldstein, Michael, Hoef, Brian, Hudyma, Russ, Jones, Gideon, Koh, Chawon, Fontaine, Bruno La, Ma, Andy, Montgomery, Warren, Niakoula, Dimitra, Park, Joo-on, Wallow, Tom, Wurm, Stefan

Publikováno v: In Microelectronic Engineering 2009 86(4):448-455

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Actinic imaging of known native defects on a full-field mask

Autor: Mochi, Iacopo, Goldberg, Kenneth A., Fontaine, Bruno La, Wood, Obert

Publikováno v: Mochi, Iacopo; Goldberg, Kenneth A.; Fontaine, Bruno La; & Wood, Obert. (2009). Actinic imaging of known native defects on a full-field mask. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/0qk738rq

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______325::2cd322a7db56cdfd0f65655e393fbe72
http://www.escholarship.org/uc/item/0qk738rq

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Advanced resist testing using the Berkeley extreme ultraviiolet microfiled exposure tool

Autor: Naulleau, Patrick P., Anderson, Chris N., Dean, Kim, Denham, Paul, Goldberg, Kenneth A., Hoef, Brian, Fontaine, Bruno La, Wallow, Tom

Publikováno v: Naulleau, Patrick P.; Anderson, Chris N.; Dean, Kim; Denham, Paul; Goldberg, Kenneth A.; Hoef, Brian; et al.(2007). Advanced resist testing using the Berkeley extreme ultraviiolet microfiled exposure tool. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/77k7w13s

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______325::4625afe6a264e7e26a4f992b1309dd8a
http://www.escholarship.org/uc/item/77k7w13s

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Printing EUV Phase-shift Masks using the 0.3NA Berkeley Micro-exposure Tool

Autor: Fontaine, Bruno La, Pawloski, Adam R., Wood, Obert R., Levinson, Harry, Denham, Paul, Gullikson, Eric, Hoef, Brian, Naulleau, Patrick, Holfeld, Christian, Chovino, Christian, Letzkus, Florian

Publikováno v: Fontaine, Bruno La; Pawloski, Adam R.; Wood, Obert R.; Levinson, Harry; Denham, Paul; Gullikson, Eric; et al.(2005). Printing EUV Phase-shift Masks using the 0.3NA Berkeley Micro-exposure Tool. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/4zv2405r

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______325::b82b3ac930979d2e6fa900c0b116dd92
http://www.escholarship.org/uc/item/4zv2405r

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Akademický článek

Study of Laser-Induced Breakdown in a 30-cm Air Gap Under a Uniform Field.

Autor: Desparois, Alain, Fontaine, Bruno La

Publikováno v: IEEE Transactions on Plasma Science. Oct2000, Vol. 28 Issue 5, p1755. 8p. 2 Diagrams, 7 Graphs.

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Akademický článek

Pushing extreme ultraviolet lithography development beyond 22 nm half pitch.

Autor: Naulleau, Patrick P., Anderson, Christopher N., Baclea-an, Lorie-Mae, Denham, Paul, George, Simi, Goldberg, Kenneth A., Goldstein, Michael, Hoef, Brian, Jones, Gideon, Koh, Chawon, Fontaine, Bruno La, Montgomery, Warren, Wallow, Tom

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Nov2009, Vol. 27 Issue 6, p2911-2915, 5p, 6 Black and White Photographs, 1 Diagram, 4 Graphs

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Periodical

Cymer LPP EUV Source System Development Status

Autor: Lin, Benjamin, Fontaine, Bruno La, Brandt, David, Farrar, Nigel

Publikováno v: ECS Transactions; March 2011, Vol. 34 Issue: 1 p231-236, 6p

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