Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Folarin Latinwo"'
Publikováno v:
Entropy, Vol 24, Iss 1, p 27 (2021)
Nonequilibrium work relations have fundamentally advanced our understanding of molecular processes. In recent years, fluctuation theorems have been extensively applied to understand transitions between equilibrium steady-states, commonly described by
Externí odkaz:
https://doaj.org/article/334481b99ee0460da29cf5c879e7ee54
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e324e6bbedd697147200a9cb1d0bad87
https://doi.org/10.1117/12.2660580
https://doi.org/10.1117/12.2660580
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ffdc54a9605ca520b9abc9cd266e5ea
https://doi.org/10.1117/12.2660436
https://doi.org/10.1117/12.2660436
Autor:
Nikolai D. Petsev, Arash Nikoubashman, Folarin Latinwo, Frank H. Stillinger, Pablo G. Debenedetti
Publikováno v:
The journal of physical chemistry. B. 126(39)
Chiral crystals and their constituent molecules play a prominent role in theories about the origin of biological homochirality and in drug discovery, design, and stability. Although the prediction and identification of stable chiral crystal structure
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eb2962c7fd8a14af31dcaef13427873d
https://pubmed.ncbi.nlm.nih.gov/36162405
https://pubmed.ncbi.nlm.nih.gov/36162405
Autor:
Folarin Latinwo, Yulu Chen, Cheng-En Wu, Peter Brooker, Hyesook Hong, Delian Yang, Hua Song, Kevin Lucas
Publikováno v:
DTCO and Computational Patterning.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::768ba323058cfa1515dd5a0f7c56aa24
https://doi.org/10.1117/12.2615990
https://doi.org/10.1117/12.2615990
Publikováno v:
Optical Microlithography XXXIV.
PTD photoresists are still the main type of photoresists used for tight pitch layers in advanced patterning. Recent experimental results show evidence that the same mechanical deformation behaviors seen in NTD photoresist process also exist in PTD ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::511ba3a7f1ce2db5a93343c94788956b
https://doi.org/10.1117/12.2584781
https://doi.org/10.1117/12.2584781
Autor:
Kevin Lucas, Cheng-En (Rich) Wu, Delian Yang, Folarin Latinwo, Peter Brooker, Hua Song, Yulu Chen
Publikováno v:
Optical Microlithography XXXII.
Due to the semiconductor industry’s ever increasing need for finer resolution and improved critical dimension (CD) control, negative tone development (NTD) photoresists (resists) have been adopted for several advanced applications in lithographic p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ac89863110e16a9bfdb9910d13add5d
https://doi.org/10.1117/12.2516344
https://doi.org/10.1117/12.2516344
Autor:
Cheng-En (Rich) Wu, Kevin Lucas, Peter Brooker, Kevin Hooker, Yulu Chen, Marco Guajardo, Folarin Latinwo
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIII.
As feature resolution and process variations continue to shrink for new nodes of both DUV and EUV lithography, the density and number of devices on advanced semiconductor masks continue to increase rapidly. These advances cause significantly increase
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed64714b6d55349d00e44766214ed545
https://doi.org/10.1117/12.2516134
https://doi.org/10.1117/12.2516134
Publikováno v:
Photomask Technology 2018.
The model accuracy for Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) applications is a critical factor for patterning success in advanced technology nodes. One difficult challenge has been the accurate and fast simulatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d73962765eaf5ec9e442dc1ebd170626
https://doi.org/10.1117/12.2501992
https://doi.org/10.1117/12.2501992
Publikováno v:
The Journal of Chemical Physics. 150:064503
Water exhibits anomalous behavior in its supercooled region. A widely invoked hypothesis to explain supercooled water's thermodynamic anomalies is the existence of a metastable liquid-liquid transition terminating at a critical point. In this work, w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::288ca82cb585ff7847b69ee57875cafd
https://doi.org/10.1063/1.5078446
https://doi.org/10.1063/1.5078446