Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Florian Didier Albin Dhalluin"'
Autor:
Luigi Scaccabarozzi, Wim van der Zande, Maurice Bogers, Laurens de Winter, Erik Ruinemans, Rob van Gils, Derk Brouns, Hans Vermeulen, Florian Didier Albin Dhalluin, Daniel Smith, Juan Diego Arias Espinoza, Maria Peter, Sven Lentzen, Jack Van der Sanden
Publikováno v:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.
EUV pellicle membranes are being pursued to protect scanner images from repeating defects caused by reticle fall-on particle defects. Because most materials highly absorb EUV, pellicle membranes must be ultrathin. In an attempt to increase the streng
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::050ffb75c25838090c8bccbe68c00d72
https://doi.org/10.1117/12.2197454
https://doi.org/10.1117/12.2197454
Autor:
Silvester Houweling, John Zimmerman, Laurens de Winters, Brian Blum, Juan Diego Arias Espinoza, Kamali Mohammad Reza, Yang Liu, Hans Meiling, Marco Reijnen, Joost de Hoogh, Nina Vladimirovna Dziomkina, Kursat Bal, Luigi Scaccabarozzi, Ijen van Mil, Carmen Zoldesi, Ronald Frank Kox, Henk Meijer, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Azeredo Lima Jorge Manuel, Derk Brouns, Robert de Kruif, Alain Kempa, Xiong Xugang, Guus Bock, Daniel Smith, Florian Didier Albin Dhalluin, Maarten Mathijs Marinus Jansen
Publikováno v:
Wood, O.R.Panning, E.M., Extreme Ultraviolet (EUV) Lithography V, 90481N-1-90481N-10
As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::834bd6f420e0f7cc25eefca0c14b11bb
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
