Zobrazeno 1 - 10
of 165
pro vyhledávání: '"Flemming Jensen"'
Autor:
Pernille Christiansen Skovlund, Jeanette Finderup, Sanne Aabo, Flemming Jensen, Henning Søndergaard, Lotte Ørneborg Rodkjær
Publikováno v:
Research Involvement and Engagement, Vol 10, Iss 1, Pp 1-14 (2024)
Abstract Background Patient and public involvement in health-related research is a new discipline in Denmark. In 2021, a national conference titled 'Patient and Public Involvement in Complex Intervention Research' provided a forum for discussion betw
Externí odkaz:
https://doaj.org/article/a3fd1f847b764c648365fc71db6bea66
Publikováno v:
Micromachines, Vol 8, Iss 1, p 13 (2017)
A nano-patterning approach on silicon dioxide (SiO2) material, which could be used for the selective growth of III-V nanowires in photovoltaic applications, is demonstrated. In this process, a silicon (Si) stamp with nanopillar structures was first f
Externí odkaz:
https://doaj.org/article/8b5d7e4b474342609e12c5e10efd2027
Publikováno v:
Le, H T, Nour, Y, Jensen, F, Knott, A, Han, A & Ouyang, Z 2023, ' Silicon Power Interposer Technology (PIT) for Integrated Power Converter ', IEEE Transactions on Power Electronics, vol. 38, no. 6, pp. 6755-6758 . https://doi.org/10.1109/TPEL.2023.3240357
Future generations of power converters must be miniaturized to power future electronic devices that are getting smaller and smarter. Monolithic integration is an ideal approach toward compact, efficient, and low-cost converters. This letter addresses
Autor:
Jörg Hübner, Flemming Jensen, Henri Jansen, Vy Thi Hoang Nguyen, Pele Leussink, Kechun Ma, Wim De Malsche, Roy Cork, Evgeniy Shkondin
Publikováno v:
Hoang Nguyen, V T, Jensen, F, Hübner, J, Shkondin, E, Cork, R, Ma, K, Leussink, P, De Malsche, W & Jansen, H 2021, ' Cr and CrO x etching using SF 6 and O 2 plasma ', Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, vol. 39, no. 3, 032201 . https://doi.org/10.1116/6.0000922
Chromium is a frequently encountered material in modern nanofabrication, directly as a functional material (e.g., photomask generation) or indirectly as a hard mask (e.g., to etch quartz). With the continuous downscaling of devices, the control of th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::16fb18de6382a64d907010edd12853ed
https://hdl.handle.net/20.500.14017/141e4971-a372-404e-91c7-b22376a6508a
https://hdl.handle.net/20.500.14017/141e4971-a372-404e-91c7-b22376a6508a
Publikováno v:
Jensen, F, Kongstad, I, Dirscherl, K, Gudla, V C & Ambat, R 2019, ' High frequency pulse anodising of recycled 5006 aluminium alloy for optimised decorative appearance ', Surface and Coatings Technology, vol. 368, pp. 42-50 . https://doi.org/10.1016/j.surfcoat.2019.04.024
High frequency (HF) pulse anodising of a recycled AA5006 Aluminium alloy has been investigated to understand the effect of pulse anodising on improvements in optical quality of anodised surfaces in a sulphuric acid bath. The investigation includes th
Autor:
Zhiqiang Liu, Li Lin, Haiyan Ou, Xiaoyan Yi, Flemming Jensen, Mengning Liang, Peter J. Wellmann, Berit Herstrøm, Philipp Schuh, Yiyu Ou, Valdas Jokubavicius, Mikael Syväjärvi
Publikováno v:
Lin, L, Ou, Y, Jokubavicius, V, Syväjärvi, M, Liang, M, Liu, Z, Yi, X, Schuh, P, Wellmann, P, Herstrøm, B, Jensen, F & Ou, H 2019, ' An adhesive bonding approach by hydrogen silsesquioxane for silicon carbide-based LED applications ', Materials Science in Semiconductor Processing, vol. 91, pp. 9-12 . https://doi.org/10.1016/j.mssp.2018.10.028
We report an adhesive bonding approach using hydrogen silsesquioxane (HSQ) for silicon carbide (SiC) samples. A hybrid light-emitting diode (LED) was successfully fabricated through bonding a near-ultraviolet (NUV) LED grown on a commercial 4H-SiC su
Autor:
Flemming Jensen, Arnold Knott, Yasser Nour, Zoran Pavlovic, Ziwei Ouyang, Cian O'Mathuna, Anpan Han, Hoa Thanh Le, Santosh Kulkarni
Publikováno v:
IEEE Transactions on Power Electronics. 34:74-85
The integration of power inductors is a roadblock in realizing highly miniaturized power supply in package (PSiP) and power supply on chip. Inductors in such power systems are used for energy storage and filtering, but they dominate in size and loss.
Autor:
Terese L. Katzenstein, Marianne Hørby Jørgensen, Christine Højte, Flemming Jensen, Marianne Nielsine Skov
Publikováno v:
Journal of pediatric gastroenterology and nutrition. 71(5)
Objectives Advances in treatment of cystic fibrosis (CF) have increased survival and thereby prevalence of patients with liver disease, making chronic liver disease one of the major complications of CF. We describe the prevalence of liver fibrosis, p
Publikováno v:
Nguyen, V T H, Jensen, F, Hübner, J, Leussink, P & Jansen, H 2020, ' On the formation of black silicon in SF 6-O 2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand ', Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 38, no. 4, 043004 . https://doi.org/10.1116/6.0000196
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 38(4):043004. American Institute of Physics
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 38(4):043004. American Institute of Physics
Black silicon (BSi or silicon micro/nanograss) is a frequently encountered phenomenon in highly directional etching of silicon using mainstream plasma etch tools. The appearance of BSi in most studies is considered to be caused by micromasks unintent
Autor:
Roy Cork, Henri Jansen, Peixiong Shi, Flemming Jensen, Meint J. de Boer, Vy Thi Hoang Nguyen, Pele Leussink, Chantal Silvestre, Kechun Ma, Jörg Hübner
Publikováno v:
ECS journal of solid state science and technology, 9(2):024002. The Electrochemical Society Inc.
Nguyen, V T H, Silvestre, C, Shi, P, Cork, R, Jensen, F, Hubner, J, Ma, K, Leussink, P, de Boer, M & Jansen, H 2020, ' The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF 6 /O 2 Cycles with Excellent 3D Profile Control at Room Temperature ', ECS Journal of Solid State Science and Technology, vol. 9, no. 2, 024002 . https://doi.org/10.1149/2162-8777/ab61ed
Nguyen, V T H, Silvestre, C, Shi, P, Cork, R, Jensen, F, Hubner, J, Ma, K, Leussink, P, de Boer, M & Jansen, H 2020, ' The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF 6 /O 2 Cycles with Excellent 3D Profile Control at Room Temperature ', ECS Journal of Solid State Science and Technology, vol. 9, no. 2, 024002 . https://doi.org/10.1149/2162-8777/ab61ed
This study focuses on the development of a fluorocarbon-free directional silicon etching process, called CORE (Clear, Oxidize, Remove, and Etch) in which a switching sequence of SF6 and O2 is operated at room temperature. This distinguishes it from t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::838be3863581ab09b6f177110b6cb7e2
https://research.utwente.nl/en/publications/ef5a1174-05b5-40d7-a0b2-2c21e8f91dda
https://research.utwente.nl/en/publications/ef5a1174-05b5-40d7-a0b2-2c21e8f91dda