Výsledky vyhledávání - "Filippo Belletti"

Enabling accurate and robust optical metrology of in device overlay

Autor: Izabela Saj, Seung Yoon Lee, Noh-Kyoung Park, Chan Hwang, Christian Marinus Leewis, Giulio Bottegal, Jan Jitse Venselaar, Sam Chen, Amy Wang, Tsiatmas Anagnostis, Giacomo Miceli, James Lee, Do-Haeng Lee, Filippo Belletti, Joon-Soo Park, Minseok Kang, Sabil Huda, Eun-Ji Yang, Jeongjin Lee

Publikováno v: Metrology, Inspection, and Process Control for Microlithography XXXIV.

Utilizing a unique high NA optical system, a new methodology to measure device overlay accurately has been developed with a key differentiation. Historically, optical techniques to measure features below the image resolution require supporting measur

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1d8cc1086bd3add6ae39964660ce0686
https://doi.org/10.1117/12.2553446

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High-NA optical CD metrology on small ln-cell targets, enabling improved higher order dose control and process control for logic

Autor: Milos Popadic, Wade Huang, R.K. Jaganatharaja, Isabel de la Fuente, Ward Tu, Hugo Augustinus Joseph Cramer, Elliott Mc Namara, Rik van Laarhoven, Sharon Hsu, Filippo Belletti

Publikováno v: SPIE Proceedings.

The logic manufacturing process requires small in-device metrology targets to exploit the full dose correction potential of the modern scanners and process tools. A high-NA angular resolved scatterometer (YieldStar S-1250D) was modified to demonstrat

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a5f13a4efb8896028aa8ff347080ea4d
https://doi.org/10.1117/12.2260268

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