Effect of Cationic Interface Defects on Band Alignment and Contact Resistance in Metal/Oxide Heterojunctions

Autor: Carsten Funck, Regina Dittmann, Stephan Menzel, Filip Dvorˇák, Mykhailo Vorokhta, David N. Mueller, Brˇetislav Šmíd, Rainer Waser, Michael Andrä, Felix Gunkel, Nicolas Raab, Vladimír Matolín, Marc-André Rose

Publikováno v: Advanced electronic materials 6(1), 1900808-(2020). doi:10.1002/aelm.201900808
Advanced electronic materials 6(1), 1900808 (2019). doi:10.1002/aelm.201900808

Advanced electronic materials 1900808 (2019). doi:10.1002/aelm.201900808
Published by Wiley, Chichester

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c1520487545f9633572496ca7f85c9be
https://juser.fz-juelich.de/record/866537