Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Ferenc Korsos"'
Autor:
Viktor Samu, Ferenc Korsos, Edward D. Moore, J. Byrnes, Bálint Fodor, Leonard M. Rubin, Zoltan Kiss, Janos Szivos, Zsolt Zolnai, Anita Pongracz
Publikováno v:
2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In this study we investigate the effect of dose rate on defect formation due to high-dose, low-energy arsenic and boron implantation into n-type and p-type Si (100) samples. Besides room temperature (RT) micro-photoluminescence imaging (μ-PL) variou
Autor:
István Soczó, Tamas Szarvas, Nicolas Laurent, Zoltan Kiss, Attila Szabo, Jordi Veirman, László Roszol, Frederic Jay, Gyorgy Nadudvari, Abdelkarim Derbouz Draoua, Mickael Albaric, Ferenc Korsos
Publikováno v:
Solar Energy Materials and Solar Cells. 186:217-226
Wafers and thicker slices of an entire n-type monocrystalline silicon ingot were studied using production-compatible electrical and optical characterization techniques. We investigated the capability of these techniques to detect efficiency limiting
Autor:
Attila Tóth, Géza László, Ferenc Korsos, Sébastien Dubois, Nicolas Enjalbert, Péter Tüttő, Krisztián Kis-Szabó
Publikováno v:
Solar Energy Materials and Solar Cells. 218:110766
A new application of the differential junction photovoltage (diff-JPV) measurement technique is introduced. The technique's capability to determine the sheet resistance of charge carriers in inversion layers Rs,inv for silicon wafers coated by differ
Publikováno v:
15th International Conference on Concentrator Photovoltaic Systems (CPV-15).
The emitter sheet resistance Rse on textured silicon wafers is measured by four-point-probe (4PP), eddy-current, and junction-photovoltage (JPV) techniques. In the sample set – manufactured for this study – Rse of diffused n++ and p++ layers and
Autor:
Jacek Lagowski, Ferenc Korsos, Gyorgy Nadudvari, John D'Amico, Andrew Findlay, Alexandre Savtchouk, Marshall Wilson
Publikováno v:
Solid State Phenomena. :128-135
Recently introduced techniques for whole wafer mapping and imaging create new possibilities for root cause analysis of emitter passivation defects. Inline compatible PL imaging identifies such defects as localized regions with increased emitter satur
Autor:
Kris Van Nieuwenhuysen, Ferenc Korsos, Valerie Depauw, Ivan Gordon, Hariharsudan Sivaramakrishnan Radhakrishnan, Jef Poortmans, Maarten Debucquoy, Robert Mertens
Publikováno v:
Energy Procedia. 38:950-958
This paper discusses on-going efforts towards reliable lifetime measurements on epilayers and the subsequent decoupling of the bulk and surface recombination components, both while it is still attached to the p+ substrate on which it is grown (“att
Autor:
Valentin D. Mihailetchi, Jacek Lagowski, Piotr Edelman, Ferenc Korsos, Gyorgy Nadudvari, Joerg Schmauder, Marshall Wilson, Zoltan Kiss, Sara Olibet
Publikováno v:
Energy Procedia. 38:209-215
We have recently introduced an improved QSS-μPCD lifetime measurement with a strict quality of decay control technique. This enabled unified, parameter free determination of the decay lifetime and the steady-state lifetime over a broad steady-state
Autor:
Gyorgy Nadudvari, Ferenc Korsos, Andras Zsovar, Zsolt Kovacs, Zoltan Kiss, Jacek Lagowski, Marshall Wilson
Publikováno v:
2013 IEEE 39th Photovoltaic Specialists Conference (PVSC).
A photoluminescence imaging based technique is introduced which enables the measurement of an emitter saturation current image of a wafer with only a single PL image over an extended range of material parameters. The QSS-μPCD technique is used for r
Autor:
Daniel Selmeczi, Ferenc Novinics, Marshall Wilson, Peter Tutto, Geza Szitasi, Ferenc Korsos, Oliver Takacs, Andrew Findlay
Publikováno v:
2012 38th IEEE Photovoltaic Specialists Conference.
In thin film photovoltaic manufacturing, a number of different technologies are now used on an industrial scale: silicon-based thin films, CIS/CIGS-based thin films, CdTe-based films and other, more exotic materials and structures. Both during resear
Autor:
John D'Amico, Atilla Toth, Marshall Wilson, L. Jastrzebski, Alexandre Savtchouk, Andrew Findlay, Radovan Kopecek, Krisztián Kis-Szabó, Kristian Peter, Jacek Lagowski, A. Pap, Ferenc Korsos, Piotr Edelman
Publikováno v:
2011 37th IEEE Photovoltaic Specialists Conference.
Advanced characterization for PV is a complex process that must address bulk defects, interfaces, passivation, and degradation phenomena. It requires not only appropriate measurement techniques, but also a coupling of measurements with treatments alt