Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Ferdi van de Wetering"'
Autor:
Selwyn Cats, Vadim Yevgenyevich Banine, Adam Lassise, Ferdi van de Wetering, Luuk Heijmans, Andrey Nikipelov, Vladimir Kvon, Andrei Mikhailovich Yakunin, Mark van de Kerkhof
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI.
With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). In this context, ASML is pursuing a dual-path approach towards zero reticle defectivity: EUVcompatible pellicle or zero particles towards reticle
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::35ca21f1365fba1deec3c0c2ede3aa3e
https://doi.org/10.1117/12.2551020
https://doi.org/10.1117/12.2551020
Autor:
P.M.J. Koelman, Bart Platier, Marc van der Schans, J Job Beckers, S Sander Nijdam, Jan van Dijk, Wilbert L. IJzerman, Ferdi van de Wetering
Publikováno v:
Plasma Sources Science and Technology, 28(3):035020. Institute of Physics
The decay of the electron density and electron collision frequency between successive discharges in a pulsed plasma jet in N2 feed gas has been investigated using microwave cavity resonance spectroscopy. The method and analysis were adapted to be abl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7d7e1359a9536b626712b09a6b2a42ef
http://www.scopus.com/inward/record.url?scp=85068005269&partnerID=8YFLogxK
http://www.scopus.com/inward/record.url?scp=85068005269&partnerID=8YFLogxK
Autor:
Christian Cloin, Michael Lercel, Christophe Smeets, Mark van de Kerkhof, Tjarko Adriaan Rudolf Van Empel, Andrei Mikhailovich Yakunin, Andrey Nikipelov, Vadim Banine, Ferdi van de Wetering
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). In this context, ASML is pursuing a dual-path approach towards zero reticle defectivity: EUV-compatible pellicle or zero particles towards reticl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e60a537528793ec771527c52ed04e8a7
https://doi.org/10.1117/12.2514874
https://doi.org/10.1117/12.2514874