Zobrazeno 1 - 10
of 37
pro vyhledávání: '"Fengzhao Dai"'
Publikováno v:
Sensors, Vol 18, Iss 1, p 196 (2018)
Underwater optical environments are seriously affected by various optical inputs, such as artificial light, sky light, and ambient scattered light. The latter two can block underwater object segmentation tasks, since they inhibit the emergence of obj
Externí odkaz:
https://doaj.org/article/8470208fe36747a4a35467ed131f9472
Publikováno v:
Sensors, Vol 17, Iss 8, p 1784 (2017)
In this paper, we propose an underwater object detection method using monocular vision sensors. In addition to commonly used visual features such as color and intensity, we investigate the potential of underwater object detection using light transmis
Externí odkaz:
https://doaj.org/article/b44d297e5bbd4949b6c23e9bc5af4d8b
Autor:
Jinghao Xu, Yang Bu, Ting Shu, Lili Fan, Shaoqing Wang, Fenghua Yuan, Songyong Pan, Xiangzhao Wang, Fengzhao Dai, Xiaona Yan
Publikováno v:
Applied optics. 60(31)
Wafer alignment is the core technique of lithographic tools. Image-processing-based wafer alignment techniques are commonly used in lithographic tools. An alignment algorithm is used to analyze the alignment mark image for obtaining the mark position
Autor:
Sikun Li, Zhu Boer, Heng Zhang, Feng Tang, Fengzhao Dai, Lifeng Duan, Zejiang Meng, Xiangzhao Wang
Publikováno v:
Optics Communications. 431:158-166
A high-order wavefront aberration (HWA) measurement method for a hyper-NA lithographic projection lens based on a binary target with eight directions and rotated regression matrix is proposed. A linear model between the aerial image intensity distrib
Autor:
Jinghao Xu, Xiangzhao Wang, Fengzhao Dai, Lili Fan, Shaoqing Wang, Songyong Pan, Fenghua Yuan, Ting Shu, Yang Bu
Publikováno v:
Applied Optics. 60:5569
We propose a novel measurement algorithm for wafer alignment technology based on principal component analysis (PCA) of a mark image. The waveform of the mark is extracted from the enlarged mark image, which is collected by CCD. The position of the ma
Publikováno v:
Applied optics. 57(33)
With the process nodes extending to sub-10-nm in advanced semiconductor manufacturing, the overlay requirements keep progressively scaling down, which makes it very important to measure overlay precisely for monitoring on-product performance. The ove
Publikováno v:
Optics Communications. 367:264-273
A novel zonal method is proposed for exact discrete reconstruction of a two-dimensional wavefront with high spatial resolution for lateral shearing interferometry. Four difference wavefronts measured in the x and y shear directions are required. Each
Autor:
Liuhua Pan, Xiangzhao Wang, Zhongliang Li, Xiangyang Zhang, Yang Bu, Nan Nan, Yan Chen, Xuan Wang, Fengzhao Dai
Publikováno v:
Optics express. 25(9)
A depth-dependent dispersion compensation algorithm for enhancing the image quality of the Fourier-domain optical coherence tomography (OCT) is presented. The dispersion related with depth in the sample is considered. Using the iterative method, an a
Autor:
戴凤钊 Fengzhao Dai, 李思坤 Sikun Li, 王向朝 Xiangzhao Wang, 杨朝兴 Chaoxing Yang, 步扬 Yang Bu, 孟泽江 Zejiang Meng
Publikováno v:
Acta Optica Sinica. 39:0911002
Publikováno v:
Chinese Journal of Lasers. 46:0704004