Zobrazeno 1 - 10
of 382
pro vyhledávání: '"Felix Nelson"'
Publikováno v:
Medical Journal of Dr. D.Y. Patil Vidyapeeth, Vol 14, Iss 1, Pp 91-93 (2021)
Difficult airway still is one of the dreaded crises in anesthesia. A well-formulated plan with all the necessary equipment should be ready when such situations are anticipated, but unanticipated difficulties can arise, and managing such cases is a ni
Externí odkaz:
https://doaj.org/article/1ea3c260178e44089418b980f992583d
Publikováno v:
Indian Journal of Anaesthesia, Vol 63, Iss 6, Pp 508-510 (2019)
Externí odkaz:
https://doaj.org/article/4b50a3d1273743cbabab0c61406fa370
Akademický článek
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Autor:
Shefer, Dmitry, Nikipelov, Andrey, van de Kerkhof, Mark, Banine, Vadim, Beckers, Job, Felix, Nelson M., Lio, Anna
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII
Extreme ultraviolet (EUV) lithography is a technology for high volume manufacturing (HVM) of integrated circuits. HVM defines critical specification for cleanliness of reticles (masks) used to impose a pattern on wafers. EUV-induced hydrogen plasma p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b159dcaa60a6862edab99d316584c786
https://doi.org/10.1117/12.2581666
https://doi.org/10.1117/12.2581666
Autor:
Nisha Rajmohan, Felix Nelson
Publikováno v:
BMH Medical Journal, Vol 6, Iss 1, Pp 33-36 (2019)
Venous gas embolism is a potentially fatal complication during operative hysteroscopy. Excessive fluid uptake during operative hysteroscopy with Glycine 1.5% can cause hyponatraemia, hypo-osmolality, hyperglycinaemia and volume overload. We present a
Autor:
Beckers, Job, van Minderhout, Boy, Blom, Paul P.M., Kroesen, Gerrit M.W., Peijnenburg, Ton, Felix, Nelson M., Lio, Anna
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI
With the introduction of Extreme Ultraviolet (EUV) lithography, the control of contamination has become crucial. Sources for contamination in EUV lithography scanners are not limited to only particle generation and release inside the scanner environm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::935ed35552c0ada8ae20e33fb1b3c15d
https://research.tue.nl/en/publications/11be3e45-979c-4cbc-a158-99099e59abf7
https://research.tue.nl/en/publications/11be3e45-979c-4cbc-a158-99099e59abf7
Autor:
van de Kerkhof, Mark, Liu, Fei, Meeuwissen, Marieke, Zhang, Xueqing, de Kruif, Robert, Davydova, Natalia, Schiffelers, Guido, Wählish, Felix, van Setten, Eelco, Varenkamp, Wouter, Ricken, Kees, de Winter, Laurens, McNamara, John, Bayraktar, Muharrem, Felix, Nelson M., Lio, Anna
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI, 11323
With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). The high EUV power of >200W being realized with this system satisfies the throughput requirements of HVM, but also requires reconsideration of th
Akademický článek
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Autor:
Felix, Nelson M., Lio, Anna, Guo, Jing, Church, Jennifer, Meli, Luciana, de Silva, Anuja, Burkhardt, Martin, Petrillo, Karen, Breton, Mary, Murray, Cody, Zou, Lijuan, Gabor, Allen, Felix, Nelson
Publikováno v:
Proceedings of SPIE; February 2021, Vol. 11609 Issue: 1 p116090U-116090U-9, 1044820p
Autor:
Surjya Prasad Upadhyay, Hassy Prakassam, Nisha Rajmohan, Felix Nelson, Anvar Sadath, Ommega Internationals
Publikováno v:
Journal of Anesthesia and Surgery. 3:171-174