Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Felix Küpper"'
Autor:
Margarete Kops, Kiyotada Nakamura, Gota Niimi, B Santos, Ralf Kops, Yusuke Teramoto, Takuma Yokoyama, Takahiro Shirai, Noritaka Ashizawa, Guido Mertens, Hiroto Sato, Hironobu Yabuta, Kunihiko Kasama, Felix Küpper, Akihisa Nagano, Masaki Yoshioka
Publikováno v:
SPIE Proceedings.
Actinic mask inspection manufactures are currently searching for high-radiance EUV sources for their tools. LDP source, which was previously used for lithography purposes, was found to be a good candidate as it can provide sufficient power and radian
Autor:
Max C. Schürmann, Peter Zink, Günther Derra, Erik Wagenaars, Marc Corthout, Hans Scheuermann, Guido Schriever, Jeroen Jonkers, Rolf Apetz, Guido Seimons, Marcel Damen, Peiter van de Wel, Rob Snijkers, Jesko Dr. Brudermann, Jürgen Klein, Masaki Yoshioka, Willi Neff, Oliver Franken, Oliver Zitzen, Dominik Marcel Vaudrevange, Felix Küpper, Arnaud Mader
Publikováno v:
SPIE Proceedings.
For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH
The mechanism of the soft x-ray generation in a pulsed high current discharge is investigated by means of time and space resolved characterization of the extreme ultraviolet emitting regions and discussion of the related electrical circuit parameters
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bfd0c2a3f968189d4967553dbbd89199
https://publica.fraunhofer.de/handle/publica/216041
https://publica.fraunhofer.de/handle/publica/216041
Publikováno v:
Journal of Applied Physics. 108:093304
The angular resolved emission of tin ions from a laser triggered vacuum arc to be used as light source for extreme ultraviolet lithography is presented. Ion energies of more than 200 keV for emission angles up to 50° with respect to the optical axis