Zobrazeno 1 - 10
of 82
pro vyhledávání: '"Felix Beaudoin"'
Autor:
Padraig Timoney, Carrie Yurkon, Jusang Lee, Mark Altwerger, Felix Beaudoin, Aarthi Sundaram, Bert Pfefferling
Publikováno v:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Autor:
Satish Kodali, Thirukumaran Mahalingam, Edmund Banghart, Felix Beaudoin, Wang Tao, Nuh Yuksek, Shweta Arora, Rohan Deshpande, Trejo Rust, Sushruth Goud Perumalla, Lu Yuan, Lillian Li, Rinus T. P. Lee, Wayne Zhao
Publikováno v:
International Symposium for Testing and Failure Analysis.
Fault localization using both dynamic laser stimulation and emission microscopy was used to localize the failing transistors within the failing scan chain latch on multiple samples. Nanoprobing was then performed and the source to drain leakage in N-
Autor:
Pietro Babighian, Lili Cheng, Wei-Hang Chen, Yuting Wei, Felix Beaudoin, Nimisha C. Sreenivasan, Ernesto Gene de la Garza
Publikováno v:
International Symposium for Testing and Failure Analysis.
A BEOL compatible Metal-Insulator-Metal capacitor (MIMCAP) was successfully developed for GlobalFoundries 14nm technology node, and subsequently introduced on customer designs as decoupling capacitors. The lead production silicon wafers with MIMCAP s
Publikováno v:
International Symposium for Testing and Failure Analysis.
OBIRCH is a static technique for isolating both high and low resistance failures in test structures that continues to be relevant to sub 14nm technologies. While limited resolution is a factor as devices get smaller, an approximate location is adequa
Publikováno v:
International Symposium for Testing and Failure Analysis.
With rapid scaling of semiconductor devices, new and more complicated challenges emerge as technology development progresses. In SRAM yield learning vehicles, it is becoming increasingly difficult to differentiate the voltage-sensitive SRAM yield los
Autor:
David Clark, Carl Schiller, Stephen Lucarini, Ishtiaq Ahsan, Fred J. Towler, Zhigang Song, Robert C. Wong, Felix Beaudoin
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 28:474-479
The SRAM bitcell array has been traditionally used as a yield learning vehicle for new technologies. However, the yield of the SRAM bitcell is susceptible to parametric variations and subtle process defects/variations. In this paper, a new functional
Publikováno v:
International Symposium for Testing and Failure Analysis.
As the technology scales down, SEM (Scanning Electron Microscope) based nanoprobing faces challenges. Transistors are more susceptible to electron beam damage. As SEM energy decreases to prevent damage, imaging resolution degrades, making it increasi
Publikováno v:
International Symposium for Testing and Failure Analysis.
With increasing complexity involved in advance node semiconductor process development, dependability on parametric test structures has also increased significantly. Test structures play a predominant role throughout the entire development cycle of a
Publikováno v:
International Symposium for Testing and Failure Analysis.
EBAC is a high-resolution, static technique that can be used for isolating electrical shorts, but it begins to fail for large, interconnected, test structures. In such cases, localization can be achieved when combined with optical localization techni