Langmuir probe measurements in an ICP

Autor: Maurice, C.Y.M., Feijen, F.H.R., Kroesen, G.M.W., Stoffels, W.W.

Publikováno v: Frontiers in low temperature plasma diagnostics IV : papers, Rolduc Conference Centre, The Netherlands, 25.03.2001-29.03.2001, 213-216
STARTPAGE=213;ENDPAGE=216;TITLE=Frontiers in low temperature plasma diagnostics IV : papers, Rolduc Conference Centre, The Netherlands, 25.03.2001-29.03.2001

In the last years, interest for high densities etching sources has rose dramatically in the semiconductor industry. Process machines need to be adapted to the manufacturer leitmotiv " as small as possible" and achieve at the same time a high aspect r

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::affd6e56ffd9b8cbe9414f61cb85a7f2
https://research.tue.nl/nl/publications/bef71ebf-9132-405e-ab49-e2ba032d1fb7